Sony Corporation

Other

Cambridge Filter Corporation

Kondoh Industries, Ltd.

Isao Honbori

Toshiro Kisakibaru

Yasushi Kato

Akira Kojima

Hitoshi Abe

Toshikazu Suzuki

Hayato Iwamoto

Toshitaka Kawashima

Satoshi Bannai

Tomohiro Chiba

Akira Yamazaki

Takayuki Fukunaga

Tomohide Jozaki

Kouta Ueno

Hirohisa Koriyama

Yoshinori Hata

Hirohisa Kooriyama

A device that can accurately detect clogging of a filter and that has a simple structure is provided. A device for measuring clogging of a filter in an air conditioner () having a blower () that blows gas (), () through a duct () and a filter () that is provided in the duct () and filters dust floating in the gas, comprises a device () for measuring a sound pressure that is provided in the duct (), a data processor () that extracts data on the sound pressure at a specific frequency from the data on the sound pressure that have been measured by means of the device () for measuring a sound pressure, and an estimating device () that estimates clogging of the filter based on the data on the sound pressure at the specific frequency that have been extracted by means of the data processor ().

Device for measuring clogging of filter in air conditioner and air conditioner

A manufacturing apparatus for a semiconductor device comprises: a clean room for installing a plurality of semiconductor manufacturing and processing apparatuses; an external air cleaning device connected to a supply port of the clean room for supplying a cleaned-up outside air into the clean room; a common air duct section installed in the clean room; a first air cleaning and ventilating means connected to said common air duct section for cleaning and ventilating a part of the cleaned-up outside air to the common air duct section; individual air duct section branched off from the common air duct section and connected to each of said semiconductor manufacturing and processing apparatuses; and a second air cleaning and ventilating means interposed between the individual air duct section and each of the semiconductor manufacturing and processing apparatuses for cleaning and ventilating the air to be supplied to each of the semiconductor manufacturing and processing apparatuses.

Manufacturing apparatus and manufacturing method for semiconductor device

The present invention provides a method for plasma control, in which an electric field is generated in the direction perpendicular to the surface of an object to be processed in plasma atmosphere generated in a processing chamber and another electric field is generated in the direction parallel to the surface, and the direction of ion or electron in plasma atmosphere is controlled by controlling the composite electric field composed of both the electric fields. The invention provides also an apparatus for plasma control provided with a perpendicular electric field generating means for generating an electric field in the direction perpendicular to the surface of the object, and a parallel electric field generating means for generating an electric field in the direction parallel to the surface of the object.

Method and apparatus for plasma control

A plasma treatment method and system allowing the plasma intensity to be controllably distributed perpendicularly to the inner wall and ensuring effective and uniform treatment in the case of executing plasma cleaning, plasma CVD, RIE or the like. In the plasma treatment where plasma is generated within a chamber 1 for plasma treatment, magnetic field 31 is applied perpendicularly to the inner wall of the chamber to produce plasma whose intensity is directed perpendicularly to the inner wall of the chamber or in parallel with the surface to be treated. Further, the magnetic filed 31 rendered into a revolving field 32 may be applied to rotate the plasma to accomplish a uniform and effective treatment.

Method and system for plasma treatment

Growing community of inventors

Tokyo, Japan

Isao Honbori