Mitsubishi Gas Chemical Company, Inc.

Bridgestone Corporation

Canon Kabushiki Kaisha

Nichiban Company Limited

Isao Hagiwara

Fumiya Zaima

Mutsuhiko Takeda

Shuzabu Sakaguchi

Kenji Ishii

Toru Harada

Yoshihide Fukahori

Hiroshi Hasegawa

Katsuhiro Iura

Takaharu Kubo

Iki Harada

Jun Yokoyama

Naruhiko Mashita

Yasumasa Norisue

Makoto Miyamoto

Masamichi Mizukami

Shunichiro Nishida

Hiroki Nakano

Katsuhiko Tsunoda

Hisashi Sakaitani

Reona Koike

Daishi Saiki

Hisashi Matsuda

Kenichiro Iuchi

Tomomi Tsutsumi

Shinjiro Sawamoto

Daisuke Kitada

Tsutomu Matsui

A nonaqueous adhesive skin patch at least comprises a backing film and an adhesive layer placed thereabove, the adhesive layer containing a local anesthetic, wherein when the total mass of an adhesive is set to 100% by mass, the adhesive layer includes the following in the ratio of: 20 to 40% by mass of an elastomer; 20 to 35% by mass of a softener; 20 to 40% by mass of a resin; 3.0 to 7.0% by mass of the local anesthetic; and 0.3 to 4.0% by mass of organic acid, and wherein the adhesive layer has a mass per unit area of 100 to 200 g/m.

Adhesive skin patch

A process for producing a thermoplastic resin composition includes kneading a mixture obtained by combining a rubber component with a ground product, the ground product being formed by grinding a thermoplastic resin molded article having an alloy resin of a polycarbonate and an ABS, and then molding the mixture after kneading. The mixture has 0.5 wt % or more and 1.5 wt % or less of the rubber component based on 100 wt % of the mixture.

Process for producing thermoplastic resin composition, and thermoplastic resin composition produced by the same

A method for producing hydrogen peroxide by an anthraquinone process includes the steps of: reducing with hydrogen a working solution containing an organic solvent and anthraquinone in the presence of a hydrogenation catalyst; and activating the hydrogenation catalyst when a hydrogenation selectivity has decreased due to repeated use, wherein the catalyst activation step includes a step of treating the hydrogenation catalyst with a first alkaline aqueous solution of pH 10 or above containing an alkali metal, and then washing the treated hydrogenation catalyst with water or a second alkaline aqueous solution that is more weakly alkaline than the first alkaline aqueous solution so as to set a catalyst soak solution comprising 5 parts by weight of pure water in admixture with 1 part by weight of the activated hydrogenation catalyst to a pH of 8.0 or above.

Method for activating hydrogenation catalyst and method for producing hydrogen peroxide including same

The present invention provides a method for producing hydrogen peroxide, comprising the steps of: alternately reducing and oxidizing a working solution containing anthraquinone compounds as a reaction medium, wherein a mixture of alkyl-substituted anthraquinones and alkyl-substituted tetrahydroanthraquinones in a molar ratio of from 2:1 to 8:1 is used as the anthraquinone compounds in the working solution, in the reduction step all of the tetrahydroanthraquinones and some or all of the anthraquinones in the working solution are reduced; and keeping the content of alkyl-substituted anthrahydroquinones in the working solution after the reduction step and before the oxidation step higher than the content of alkyl-substituted tetrahydroanthrahydroquinones, wherein ethylanthraquinone and ethyltetrahydroanthraquinone are used as anthraquinone compounds in the working solution in a total proportion of both of from 10 to 45 mol % of all of the anthraquinone compounds in the working solution.

Method for producing hydrogen peroxide

The rubber composition and the material suitable for preparing the rubber composition show high gas-barrier properties and being free from inhibition of vulcanization. The rubber composition is essentially composed of a rubber and a layered mineral filler treated with short chain alkyl ammonium salt.

Rubber composition

Photosensitive resin

Disclosed is a photosensitive resin which can give a photosensitive resin composition having excellent heat durability and excellent developability and showing excellent heat durability and excellent electric insulation reliability in a humidified state. The photosensitive resin composition contains the above photosensitive resin which is a reaction product produced by reacting an epoxy acrylate with a cyanate ester compound to obtain a reaction product (A) and reacting the reaction product (A) with a polybasic acid anhydride, and an epoxy resin.

Photosensitive resin and photosensitive resin composition

A seismic isolation apparatus which has a composite multilayered member comprising a plurality of hard plates having rigidity and a plurality of soft plates having viscoelastic property which are arranged to form alternating layers between an upper flange and a lower flange; and satisfies the condition that the proper vibration to the horizontal direction of the seismic isolation apparatus which is represented by f.sub.H and obtained by the equation ##EQU1## wherein K.sub.H represents a spring constant of the seismic isolation apparatus to the horizontal direction, M represents mass of a structure mounted on the seismic isolation apparatus, and f.sub.H has a value in the range of: 0.1 Hz.ltoreq.f.sub.H .ltoreq.2 Hz when the displacement of the seismic isolation apparatus in the horizontal direction is 2 mm or less, 0.1 Hz.ltoreq.f.sub.H .ltoreq.0.8 Hz when the displacement of the seismic isolation apparatus in the horizontal direction is equal to 100% shearing strain, and 0.9 Hz.ltoreq.f.sub.H when deformation in terms of shearing strain is relaxed by 10% from the maximum deformation in measurement of a hysteresis loop of the seismic isolation apparatus. The seismic isolation apparatus has the function of seismic isolation, prevention of shake by wind, and isolation of traffic vibration and is advantageously used for structures having a light weicht, such as single family houses.

Seismic isolation device

A seismic isolation apparatus which has a composite multilayered member comprising a plurality of hard plates having rigidity and a plurality of soft plates having viscoelastic property which are arranged to form alternating layers between an upper flange and a lower flange; and satisfies the condition that the proper vibration to the horizontal direction of the seismic isolation apparatus which is represented by f.sub.H and obtained by the equation f.sub.H =1/2p.sqroot.K.sub.H M wherein K.sub.H represents a spring constant of the seismic isolation apparatus to the horizontal direction, M represents mass of a structure mounted on the seismic isolation apparatus, and f.sub.H has a value in the range of: 0.1 Hz.ltoreq.f.sub.H .ltoreq.2 Hz when the displacement of the seismic isolation apparatus in the horizontal direction is 2 mm or less, 0.1 Hz.ltoreq.f.sub.H .ltoreq.0.8 Hz when the displacement of the seismic isolation apparatus in the horizontal direction is equal to 100% shearing strain, and 0.9 Hz.ltoreq.f.sub.H when deformation in terms of shearing strain is relaxed by 10% from the maximum deformation in measurement of a hysteresis loop of the seismic isolation apparatus. The seismic isolation apparatus has the function of seismic isolation, prevention of shake by wind, and isolation of traffic vibration and is advantageously used for structures having a light weight, such as single family houses.

Seismic isolation apparatus

Novel methylthiophenol derivatives of the formula (I') and of the formula (IV) and processes for producing said derivatives ##STR1## wherein R is a tert-butyloxy group, a tert-amyloxy group, a p-methoxybenzyloxy group, a 2-(trimethylsilyl)ethoxy group, a 1-adamantyloxy group, a bornyloxy group, or an isobornyloxy group.

Methylthiophenol derivatives and p-methylthiophenyl chloroformates and

A process for producing sulfonium compounds represented by the general formula (III) which comprises reacting alkylthiophenol derivatives represented by the general formula (I) and dialkyl sulfate represented by the general formula (II).

Process for production of sulfonium compounds

Disclosed is process for producing a sulfonium compound of the general formula (III), comprising reacting alkylthiophenol derivative of the general formula (I) and dialkyl sulfate of the general formula (II) in the presence of at least one inorganic compound selected from the group consisting of alkali metal carbonate, alkali metal hydrogencarbonate, alkaline earth metal hydroxide, alkaline earth metal carbonate, and oxides of Group II metals of the Periodic Table. ##STR1## wherein all the symbols are as defined in the appended claims.

Process for production of sulfonium compounds and novel methylthiphenol

A process for producing a sulfonium compound of the formula (III) ##STR1## which process comprises reacting a p-dialkylsulfoniophenol of the formula (I) ##STR2## and a carbonyl halogenide compound of the formula (II) ##STR3## in the presence of a secondary amine having a structure in which two secondary alkyl groups are linked to the nitrogen atom, wherein R.sup.1 and R.sup.2 are the same or different and are independently an alkyl group having 1 to 4 carbon atoms, X.sup.1 is a hydrogen atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms, Y.sup.- is a halogen anion, a perchlorate anion, an alkylsulfate anion, a hydrogensulfate anion or a p-toluenesulfonate anion, R is an alkyl group having 1 to 20 carbon atoms, a tert-butoxy group, a benzyloxy group, a p-methoxybenzyloxy group, a phenyl group or a 9-fluorenylmethoxy group, and X.sup.2 is a halogen atom, wherein the reacting is carried out in a solvent selected from the group consisting of polar aprotic solvents, ethers and halogenated hydrocarbons, at a temperature of -80.degree. C. to 30.degree. C. and for a reaction time of 0.5 hour to 10 hours.

Growing community of inventors

Tokyo, Japan

Isao Hagiwara