Sumitomo Metal Mining Company, Ltd.

Mitsui Minings & Melting Co., Ltd.

Isao Ando

Keiichi Sato

Makoto Ozawa

Tetsufumi Komukai

Masanori Takagi

Kentaro Sogabe

Toshio Morimoto

Tatsuya Takahashi

Hirotaka Minami

Eriko Sato

A cesium tungsten oxide film has high heat ray shielding performance and a radio wave transmissivity, and a method for manufacturing a cesium tungsten oxide film capable of manufacturing such film by a dry method. A cesium tungsten oxide film including cesium, tungsten and oxygen as main components, wherein, an atomic ratio of the cesium and the tungsten is Cs/W, which is 0.1 or more and 0.5 or less, and the cesium tungsten oxide film is having a hexagonal crystal structure. A method for manufacturing a cesium tungsten oxide film including cesium, tungsten and oxygen as main components, including: a film deposition process using a cesium tungsten oxide target; and a heat treatment process for heat-treating the film at a temperature of 400° C. or more and less than 1000° C., wherein either the film deposition process or the heat treatment process is performed in an atmosphere containing oxygen.

Cesium tungsten oxide film and method for manufacturing same

Purpose of the present invention is to provide a composite tungsten oxide film having a transmissivity of light with a wavelength of 700 to 1200 nm, in addition to a function to shield light by absorbing light, a function to generate heat by absorbing light and a function to release electrons by absorbing light, and also having a substantial radio wave transmissivity, and having both of an infrared light absorbing property in an infrared light region and a transparency in a visible light region, and a method for manufacturing the composite tungsten oxide film, and further, to provide a film-deposited base material or an article using any of or a plurality of the above functions. A composite tungsten oxide film comprising a composition represented by a general formula MWO(wherein, an element M is one or more elements selected from alkaline metal, alkaline earth metal, Fe, In, Tl, and Sn, an element W is tungsten, and an element O is oxygen) as main components, wherein 0.001≤x/y≤1, 2.2≤z/y≤3.0, organic components are not contained substantially, a sheet resistance is 10ohms per square or more, a transmittance in a wavelength of 550 nm is 50% or more, a transmittance in a wavelength of 1400 nm is 30% or less, and also, an absorptance in a wavelength of 1400 nm is 35% or more, and an absorptance in a wavelength of 800 nm with respect to an absorptance in a wavelength of 1400 nm is 80% or less.

Composite tungsten oxide film and method for producing same, and film-deposited base material and article each provided with said film

A composite tungsten oxide film having high film smoothness, with a function to shield infrared light by reflecting infrared light by a thermal insulation, while maintaining transparency in a visible light region, and a method for manufacturing the composite tungsten oxide film, and a film-deposited base material or an article using these functions. A composite tungsten oxide film including a composition with a general formula MWOas main components, wherein 0.001≤x/y≤1, 2.2≤z/y≤3.0, organic components are not contained substantially, a transmittance in a wavelength of 550 nm is 50% or more, a transmittance in a wavelength of 1400 nm is 30% or less, and also, a reflectance in a wavelength of 1400 nm is 35% or more.

Provided is a sputtering target having extremely low occurrence of arcing or nodules, and a method for manufacturing such a sputtering target. A flat plate-shaped or cylindrical target material () is obtained by processing a material composed of an oxide sintered body. In doing so, a grindstone having a specified grade is used to perform rough grinding of a surface of the material that will become a sputtering surface () one or more times in accordance to the grade of the grindstone, after which zero grinding is performed one or more times so that the surface roughness of the sputtering surface () has an arithmetic mean roughness Ra of 0.9 &#x3bc;m or more, a maximum height Rz of 10.0 &#x3bc;m or less, and Rzroughness of 7.0 &#x3bc;m or less. A sputtering target () is obtained by bonding the obtained target material () to a backing body () by way of a bonding layer ().

Target material for sputtering and method for manufacturing same

The present invention provides: an oxide sintered body having superior manufacturing stability, film stability, discharge stability, and mechanical strength; a process for manufacturing the same; and an oxide film obtained by using the oxide sintered body and having an intermediate refractive index. The oxide sintered body comprising In and Si, wherein a Si content is 0.65 to 1.75 in Si/In atomic ratio, a relative density is 90% or more, and a bending strength is 90 N/mmor more, is manufactured, and the oxide film with refractive index of 1.70 to 1.90 by a sputtering process using the oxide sintered body is manufactured.

Oxide sintered body, process for manufacturing same, and oxide film

Provided are a method for producing a Cu&#x2014;Ga alloy powder, by which a high quality Cu&#x2014;Ga alloy powder to be produced readily; a Cu&#x2014;Ga alloy powder; a method for producing a Cu&#x2014;Ga alloy sputtering target; and a Cu&#x2014;Ga alloy sputtering target. Specifically, a Cu&#x2014;Ga alloy powder is produced by stirring a mixed powder containing a Cu powder and a Ga in a mass ratio of 85:15 to 55:45 at a temperature of 30 to 700&#xb0; C. in an inert atmosphere thereby accomplishing alloying. Also a Cu&#x2014;Ga alloy sputtering target is produced by molding the Cu&#x2014;Ga alloy powder followed by sintering.

Growing community of inventors

Tokyo, Japan

Isao Ando