Tokyo Ohka Kogyo Co., Ltd.

Isamu Takagi

Kenri Konno

Tomoyuki Hirano

Daiju Shiono

Kazufumi Sato

Jun Iwashita

Daichi Takaki

Yasushi Fujii

Masahito Yahagi

Daisuke Kawana

Tomotaka Yamada

Toshikazu Takayama

Hisanobu Harada

Hiroyuki Ohnishi

Koji Yonemura

Kazuhiko Nakayama

A method of forming a resist pattern including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent by action of an acid; exposing the resist film; and patterning by a negative-tone development using a developing solution containing the organic solvent, wherein the base component (A) contains a resin component (A1) having a structural unit (a0) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the &#x3b1;-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid, and the developing solution contains a nitrile solvent.

Method of forming resist pattern and negative tone-development resist composition

Positive resist composition and method of forming resist pattern

A photosensitive resin composition which has a quenching function and satisfactory long-term stability and which, in particular, can be prevented from suffering sensitivity abnormality caused by change with time during storage (change from given sensitivity); and a method of forming a pattern from the composition. The resist composition contains a base resin comprising, as the main component, a silicon-containing polymer which is a siloxane or silsesquioxane polymer or the like, the composition containing, as a quencher, a specific sulfonium compound in place of a nitrogenous compound.

Photosensitive resin composition and method of forming pattern

A method for removing a resist pattern having a resist pattern forming step of forming a resist pattern on a substrate using a chemically amplified positive resist composition and a removing step of removing the resist pattern from the substrate using a solvent,

Method for removing resist pattern

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Kawasaki, Japan

Isamu Takagi