Mitsubishi Denki Kabushiki Kaisha

Other

Seiko Instruments Inc

Isamu Karino

Naohiko Fujino

Masatoshi Yasutake

Shigeru Wakiyama

Masashi Ohmori

Takashi Masuda

Junji Kobayashi

Masahiro Sekine

Hiroshi Kurokawa

Nobuyoshi Hattori

Osamu Wada

Kazuo Kuramoto

Shigeto Maejima

Seiichi Mitumoto

Masahi Ohmori

Fusami Soeda

Yoshitsugu Nakagawa

Koichiro Hori

Method and apparatus for analyzing minute foreign substance, and process for semiconductor elements or liquid crystal elements by use thereof

To enable observation, analysis and evaluation of minute foreign substances by adopting a method for enabling performance of linkage between equipment coordinates of a particle examination equipment and apparatus coordinates of an analyzing apparatus such as SEM which is not a particle examination equipment with a precision higher than that with which coordinate linkage is performed between conventional equipment and apparatus coordinates. An analyzing method for analyzing minute foreign substances comprises the steps of determining the position of a minute foreign substance on the surface of a sample in a particle examination equipment, transferring the sample to a coordinate stage of an analyzing apparatus and inputting the position of the minute foreign substance determined by the particle examination equipment to thereby analyze the contents of this minute foreign substance. It is characterized by linking the equipment coordinates adopted by the particle examination equipment with the apparatus coordinates adopted by the analyzing apparatus by use of the same coordinate system based on the configurations of the sample.

Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same

To provide a minute foreign matter analysis method and device wherein the observation, analysis and estimation of minute foreign matter is permitted by linking the device coordinate of a particle inspection device and those of other analysis devices with by far higher accuracy. A minute foreign matter analysis method comprising the steps of: determining the position of a minute foreign substance on the surface of a sample in a particle test unit; transferring said sample onto a coordinate stage of an analysis unit; inputting the position determined by said particle test unit for the minute foreign substance to the coordinate stage of the analysis unit; and analyzing the contents of the relevant minute foreign substance wherein at least one of the unit coordinate to be employed in said particle test unit and the unit coordinate to be employed in said analysis unit is previously corrected using a standard wafer which has a scale on the surface so that coordination systems of said particle test unit and said analysis unit can be linked each other.

Method for analyzing minute foreign substance elements

To enable observation, analysis and evaluation of minute foreign substances by adopting a method for enabling performance of linkage between equipment coordinates of a particle examination equipment and apparatus coordinates of an analyzing apparatus such as SEM which is not a particle examination equipment with a precision higher than that with which coordinate linkage is performed between conventional equipment and apparatus coordinates. An analyzing method for analyzing minute foreign substances includes the steps of determining the position of a minute foreign substance on the surface of a sample in a particle examination equipment, transferring the sample to a coordinate stage of an analyzing apparatus and inputting the position of the minute foreign substance determined by the particle examination equipment to thereby analyze the contents of this minute foreign substance. It is characterized by linking the equipment coordinates adopted by the particle examination equipment with the apparatus coordinates adopted by the analyzing apparatus by use of the same coordinate system based on the configurations of the sample.

Analyzing method and apparatus for minute foreign substances, and

An object of the present invention is to provide a method of recovering the insulation by means of simple steps rapidly and easily at low cost, and paints used therefor. For that purpose, the insulating paint of the present invention which comprises an electric insulation film forming agent and an ion-exchangeable material is applied on the part of a printed circuit board where the insulation was lowered or is expected to be lowered.

Insulating paints

Methods wherein a partial region of a fine foreign matter which is detected first in a particle counter is detected again, observed, analyzed and evaluated by irradiating a spot of beam light to the region, observing a scattered light from a dark field or a dark part in the spot from a blight field, a coordinate of the analyzer being linked with a coordinate of the partial counter and registered in the analyzer. Thereby semiconductor devices or liquid crystal display devices are inspected accurately and immediately.

Method of detecting the position and the content of fine foreign matter

Method for detecting and examining a slightly irregular surface state is provided which includes the steps of: illuminating a surface of a sample with light beam for detecting the slightly irregular surface state; observing a variation of the light beam occurring due to the slightly irregular surface state to specify the location of the slightly irregular surface state in an x-y plane of the sample; making the location of a probe needle of a scanning probe microscope and the location of the slightly irregular surface state on the sample coincide with each other; and measuring a three-dimensional image of the slightly irregular surface state by means of the scanning probe microscope. The scanning probe microscope for use in the aforementioned method and a method for fabricating a semiconductor device or a liquid crystal display device which utilizes the aforementioned method are also provided.

Method for detecting and examining slightly irregular surface states,

Growing community of inventors

Hyogo, Japan

Isamu Karino