Asahi Glass Company, Limited

Isamu Kaneko

Yoko Takebe

Shun-ichi Kodama

Yasuhide Kawaguchi

Shinji Okada

Masahiro Ito

Takashi Okazoe

Kunio Watanabe

Daisuke Shirakawa

Kazuya Oharu

Atsushi Watakabe

Susumu Saito

Shunichi Samejima

Osamu Yokokoji

Jyunichi Tayanagi

Masaru Nakamura

Masaaki Yamabe

Gen Kojima

Seiji Munekata

Masashi Matsuo

Motoi Kamba

Koichi Murata

Seisaku Kumai

Satoru Hommura

Tetsuji Shimohira

Shin Tatematsu

Haruhisa Miyake

Norihide Sugiyama

Hiroki Kamiya

Seigo Kotera

Kimiaki Kashiwagi

Hiroshi Ukihashi

Shunsuke Yokotsuka

Masakuni Sato

Gen Ogawa

To provide a polymer electrolyte material for polymer electrolyte fuel cells, which is an electrolyte material having a high ion exchange capacity and a low resistance, and which has a higher softening temperature than a conventional electrolyte material. An electrolyte material for polymer electrolyte fuel cells, which is made of a polymer containing repeating units based on a fluoromonomer having a radical polymerization reactivity, wherein the repeating units contain, in their side chains, a structure having ionic groups represented in the following formula (&#x3b1;) (provided that in the formula, each of Qand Qwhich are independent of each other, is a single bond or a perfluoroalkylene group that may have an etheric oxygen atom, provided that they are not single bonds at the same time, Ris a perfluoroalkyl group which may have an etheric oxygen atom, and X is an oxygen atom, a nitrogen atom or a carbon atom, provided that when X is an oxygen atom, a=0, when X is a nitrogen atom, a=1, and when X is a carbon atom, a=2, and Y is a fluorine atom or a monovalent perfluoro organic group). 

Electrolyte material for polymer electrolyte fuel cells, electrolyte membrane and membrane/electrode assembly

The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSOR-E(1) with R-E(2) to form XSOR-E-R(3), then reacting (3) with fluorine in a liquid phase to form FSOR-E-R(4), and further, decomposing the compound to obtain FSO-E(5), wherein Ris a bivalent organic group, Eis a monovalent reactive group, Ris a monovalent organic group, Eis a monovalent reactive group which is reactive with E, E is a bivalent connecting group formed by the reaction of Ewith E, Ris a bivalent organic group formed by the fluorination of R, etc., Ris the same group as R, etc., Eis a bivalent connecting group formed by the fluorination of E, etc., Eis a monovalent group formed by the decomposition of E, and X is a halogen atom.

Process for producing a fluorine atom-containing sulfonyl fluoride compound

The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSOR-E(1) with R-E(2) to form XSOR-E-R(3), then reacting (3) with fluorine in a liquid phase to form FSOR-E-R(4), and further, decomposing the compound to obtain FSOR-E(5), wherein Ris a bivalent organic group, Eis a monovalent reactive group, Ris a monovalent organic group, Eis a monovalent reactive group which is reactive with E, E is a bivalent connecting group formed by the reaction of Ewith E, Ris a bivalent organic group formed by the fluorination of R, etc., Ris the same group as R, etc., Eis a bivalent connecting group formed by the fluorination of E, etc., Eis a monovalent group formed by the decomposition of E, and X is a halogen atom.

A compound containing two fluorosulfonyl groups which are groups convertible to sulfonic acid groups, an intermediate therefor, and methods for their production with high productivity, are provided. Also provided are a fluorosulfonyl group-containing polymer obtained by polymerizing such a compound, and a sulfonic acid group-containing polymer obtained from such a polymer. A method for producing a compound of the following formula (m0), such a compound, a fluorosulfonyl group-containing polymer obtained by polymerizing such a compound, and a sulfonic acid group-containing polymer obtained from such a polymer, provided that Ris a single bond or a Cbivalent perfluoro organic group, Ris a Cbivalent perfluoro organic group, and n is 0 or 1.

Fluorosulfonyl group-containing compound, method for its production and polymer thereof

To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1):CF&#x2550;CFCHCH-Q-CHCH&#x2550;CH&#x2003;&#x2003;(1)wherein Q is (CH)C(CF)OR(wherein a is an integer of from 0 to 3, Ris an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CHR(wherein Ris an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH)COOR(wherein d is 0 or 1, and Ris a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.

Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it

A compound containing two fluorosulfonyl groups which are groups convertible to sulfonic acid groups, an intermediate therefor, and methods for their production with high productivity, are provided. Also provided are a fluorosulfonyl group-containing polymer obtained by polymerizing such a compound, and a sulfonic acid group-containing polymer obtained from such a polymer. A method for producing a compound of the following formula (m0), such a compound, a fluorosulfonyl group-containing polymer obtained by polymerizing such a compound, and a sulfonic acid group-containing polymer obtained from such a polymer, provided that Ris a single bond or a Cbivalent perfluoro organic group, Ris a Cbivalent perfluoro organic group, and n is 0 or 1: 

To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3),CF&#x2550;CFCF&#x2014;C(CF)(R)&#x2014;CHCH&#x2550;CH&#x2003;&#x2003;(3)wherein Ris either a hydroxyl group blocked by &#x2014;CHR&#x2014;O&#x2014;Ror an organic group having the hydroxyl group, and Ris a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.

Fluoropolymer

To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1):CFR&#x2550;CR&#x2014;Q&#x2014;CR&#x2550;CHR&#x2003;&#x2003;(1)wherein each of Rto Rwhich are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Fluorinated compound, fluoropolymer and process for its production

To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1):CFR&#x2550;CR-Q-CR&#x2550;CHR&#x2003;&#x2003;(1)wherein each of Rto Rwhich are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

The following resist composition which is excellent particularly in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc., as a chemical amplification type resist, is presented. A resist composition which comprises a fluoropolymer (A) having repeating units represented by a structure formed by the cyclopolymerization of one molecule of a fluorinated diene and one molecule of a monoene, in which the monoene unit in each repeating unit has a blocked acid group capable of regenerating the acid group by the action of an acid, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

Resist composition

A fluoropolymer having repeating units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the following formula:CF&#x2550;CR-Q-CR&#x2550;CH&#x2003;&#x2003;(1)wherein each of Rand Rwhich are independent of each other, is a hydrogen atom, a fluorine atom, an alkyl group having at most 3 carbon atoms, or a fluoroalkyl group having at most 3 carbon atoms, and Q is a bivalent organic group having a functional group bonded thereto, and a production method which comprises subjecting the above diene to radical polymerization. The polymer has a high Tg and a functional group concentration sufficient to exhibit the characteristics thereof.

A resist composition containing a fluoropolymer, an acid-generating compound and an organic solvent, a resist film, and methods for making thereof.

Growing community of inventors

Kanagawa, Japan

Isamu Kaneko