Hitachi, Ltd.

National Research Institute of Police Science

Isaac Ohsawa

Yasuaki Takada

Izumi Waki

Hisashi Nagano

Hidehiro Okada

Yasuo Seto

Masao Suga

Tatsuo Nojiri

Yasuhiro Sano

Shigeharu Yamashiro

Hiroshi Sekiguchi

Akihiko Okumura

Hisashi Maruko

A gas monitoring apparatus includes a sample introducing portion, a measurement portion, an ionization portion, a mass analysis portion, a data processing portion and a display. The sample introducing portion introduces a sample gas including an object material to be measured. The measurement portion measures a concentration of a predetermined coexisting material, which coexists with the object material in the sample gas. The ionization portion ionizes the sample gas. The mass analysis portion analyzes mass of an ion produced by the ionization portion. The data processing portion analyzes signals detected by the mass analysis portion to calculate a concentration of the object material. And the display displays results of analysis conducted by the data processing portion. The data processing portion includes an adjustment portion which adjusts the concentration of the object material according to the concentration of the predetermined coexisting material.

Gas monitoring apparatus

A gas monitoring apparatus capable of real-time detection of a kind of chemical warfare agent, namely diphenylcyanoarsine (DC) and/or diphenylchloroarsine (DA). Atmospheric pressure chemical ionization mass spectrometry is carried out in the positive ionization mode, the total amount of DC and DA is determined from the intensity of an ion common to DC and DA, the DC concentration is determined from the intensity of an ion specific to DC, and the difference between them is regarded as the DA concentration.

Gas monitoring apparatus and gas monitoring method

Growing community of inventors

Kashiwa, Japan

Isaac Ohsawa