Ashland, Inc.

Ppt Research, Inc.

Other

Basf Aktiengesellschaft

Air Products and Chemicals, Inc.

Act, Inc.

Advanced Scientific Concepts, Inc.

Concept Sciences, Inc.

Ashland Oil Company

Pure Energy Technology Co

Basf Se Corporation

Irl E Ward

Francis W Michelotti

Darryl W Peters

Danielle French

Matthew I Egbe

Jennifer M Rieker

Floyd L Riddle

David William Bonser

Alan R Duly

Phuong Tang

Leslie D Molnar

Deliang Ding

Jesse Leaymen

Frank W Michelotti

Darryl Wayne Peters

Floyd Riddle

A slurry composition for use as a lubricant and/or a stable suspension medium to suspend inert organic or inorganic particles which is an aqueous or polar solvent carrier containing gel particles as a lubricating and suspending agent for inert organic or inorganic particles. The composition can contain inorganic salts to provide additional electrostatic repulsion.

Stable aqueous slurry suspensions

The invention relates to a cutting and lubricating suspension composition containing gelatinous particles for cutting hard and brittle material with a wire saw. The composition contains an in situ partially neutralized polyelectrolyte and a glycol which suspends abrasive particles used in the cutting operation.

Cutting and lubricating composition for use with a wire cutting apparatus

Corrosion inhibiting composition for use in aqueous or semi-aqueous stripping, cleaning, abrasive lapping and abrasive slurry compositions that form 5, 6, 7, or 8-membered chelating rings with a base metal together with a film forming polymeric chelation agent. Optionally there is included an oxygen scavenger.

Corrosion inhibiting compositions

There is provided a method and composition for rinsing sliced ingots into wafers from a wire saw cutting operation. The method uses an alkoxylated alcohol diluted in water alone or with a polyalkyl siloxane when the bath has a dynamic flow of water to prevent foaming.

Wafer/Ingot cleaning in wire saw cutting comprising an ethoxylated alcohol/polyalkylsiloxane mixture

A method and an apparatus is provided for the separation of liquid-liquid and liquid-solids compositions by flash evaporation in a heated vacuum chamber. The compositions are injected through an atomizing spray nozzle having a spray cone downward of about 30 to 150 degrees. The compositions are preheated and injected under pressure into the preheated vacuum evaporation chamber. The vaporized liquid that is formed is collected in a condenser which draws the vapors by vacuum or pressure differential. Any solids are collected at the bottom of the vacuum chamber as semi-dry or dry solids.

Apparatus and method for separation

An aqueous slurry composition for lapping, saw wire cutting, and finishing operations which contains about 0.1 to 70% by weight of abrasive particles, 0.1 to 20% by weight of suspending particles that have a density of less than or similar to the aqueous or semi-aqueous carrier medium, and the method for creating the suspension.

A composition and method using same for removing photoresist and/or processing residue from a substrate are described herein. In one aspect, there is provided a composition for removing residue consisting essentially of: an acidic buffer solution having an acid selected from a carboxylic acid or a polybasic acid and an ammonium salt of the acid in a molar ratio of acid to ammonium salt ranging from 10:1 to 1:10; an organic polar solvent that is miscible in all proportions in water; a fluoride, and water wherein the composition has a pH ranging from about 3 to about 7.

Compositions for the removal of organic and inorganic residues

The invention relates to the preparation of ultra-high purity 1,2-diaminocyclohexane-tetraacetic acid being essentially free of unwanted metal and metal ion contaminants and its use as a stabilizer for ultra-high purity hydroxylamine compounds used extensively in the production of high premium electronic components.

Preparation and purification of hydroxylamine stabilizers

The invention relates to the preparation of ultra-high purity 1,2-diaminocyclohexanetetraacetic acid being essentially free of unwanted metal and metal ion contaminants and its use as a stabilizer for ultra-high purity hydroxylamine compounds used extensively in the production of high premium electronic components.

The present invention relates to compositions useful in removing photoresist and organic and inorganic residues and processes for removal of photoresists and etch residues. The compositions are aqueous, acidic compositions containing fluoride and organic polar solvents. The compositions are free of glycols and have a low surface tension and viscosity. Corrosion inhibitors are optionally present.

Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature

A lubricating composition which may contain up to 70 weight percent abrasive grit material for use with wire saw and slicing apparatus for cutting or slicing hard and brittle materials. The composition contains abrasive particles suspended in a mixture of high and low molecular weight polyalkylene glycols and a suspension agent. The viscosity of the composition is about 50 to 700 cps.

An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper or titanium containing substrates.

Aqueous stripping and cleaning compositions

An aqueous stripping composition comprising a mixture of a polar amine, an organic or inorganic amine and a corrosion inhibitor which is gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any substantial amount of metal ions.

An aqueous stripping composition comprising a mixture of about 55% to 70% by weight of a polar amine solvent, about 22.5 to 15% by weight of a basic amine, especially hydroxylamine, a corrosion inhibitor and water. The stripping composition is effective for stripping photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures.

Aqueous stripping and cleaning compositions containing hydroxylamine and

The invention provides a method for purification of hydroxylamine so as to have a substantial reduction of cations and anions. The method involves passing a solution of hydroxylamine through at least one strong acid ion exchange bed which has been pretreated with dilute hydrochloric acid and then through at least one strong base anion exchange resin bed which has been pretreated or regenerated with a non-metal amino or hydroxide base solution.

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Bethlehem, PA, United States of America

Irl E Ward