International Business Machines Corporation

Ancosys Gmbh

Globalfoundries Inc.

Irene Popova

Wu-Song S Huang

Pushkara Rao Varanasi

Libor Vyklicky

Mahmoud M Khojasteh

Margaret C Lawson

Kaushal S Patel

Juerg Stahl

Christian Rueckl

James F Cameron

Sen Liu

Martin Glodde

Wenjie Li

John Paul Amara

Jin Wuk Sung

David A Valeri

Jürg Stahl

Greogory P Prokopowicz

Christian Rückel

Christian RÜCKL

Sen Liu`

Device for metering powder, in particular in clean-rooms, which includes a vessel containing powder and a sealing head with a septum for the vessel, wherein the sealing head is connectable powder-tight with the vessel and the septum powder-tight with the sealing head and the device further includes a vessel holder, which serves to hold the sealing head of the vessel, and the vessel with its opening points downwards, so that the powder can flow out of the vessel, wherein a gap is provided between the sealing head and a holding bowl of the vessel holder, in which a gas flow between the holding bowl and the sealing head can be created. The invention also relates to a use of the device and a metered addition method.

Device for powder metering for chemical production processes under clean-room conditions, use thereof and metered addition method

Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.

Coating compositions suitable for use with an overcoated photoresist

A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.

Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same

The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.

Top antireflective coating composition containing hydrophobic and acidic groups

A photoacid generator compound PA, comprises an antenna group Pcomprising a cation that generates protons upon interaction with light, and Acomprising a weakly coordinating peracceptor-substituted aromatic anion that does not contain fluorine or semi-metallic elements such as boron. In one embodiment, such anions comprise the following compounds 4, 5, 6 and 7, wherein E comprises an electron-withdrawing group and the removal of one proton generates aromaticity. Pcomprises an onium cation that decomposes into a proton and other components upon interaction with photons. Pmay comprise an organic chalcogen onium cation or a halonium cation, wherein the chalcogen onium cation in another embodiment may comprises an oxonium, sulfonium, selenium, tellurium, or onium cation, and the halonium cation may comprise an iodonium, chlorine or bromine onium cation. A novel compound comprises TPS CN5. A photolithographic formulation comprises the photoacid generator in combination with a photolithographic composition such as a photolithographic polymer. The formulation, when on a substrate, is exposed to optical lithographic radiation or ArF (193 nm) or KrF (248 nm) radiation, and developed. A product comprises an article of manufacture made by the method of the invention.

Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions

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Beacon, NY, United States of America

Irene Popova