Tokyo Electron Limited

Ippei Hamada

Hiroki Sato

Masashi Tsuchiyama

Tsuyoshi Watanabe

An apparatus includes: a treatment block including treatment modules; and a relay block coupling the treatment block and an exposure apparatus in a width direction, and including a transfer-in/out mechanism for the exposure apparatus. In the treatment block being multilayered in an up-down direction, a transfer mechanism is provided in a transfer region extending in the width direction. In a layer, in the treatment block, at a position accessible from the transfer-in/out mechanism, a deliverer on which the substrate is mounted when the substrate is delivered between the blocks is provided at an end on the relay block side. Pre-exposure storages storing the substrate before the exposure are provided along the width direction in two regions between which the transfer region is interposed in a depth direction. A non-treatment unit is provided at a portion where the pre-exposure storages are not provided in the two regions.

Coating and developing apparatus and coating and developing method

An apparatus includes: a treatment block; and a relay block including a first transfer-in/out module for an exposure apparatus. In the treatment block, a treatment module is provided in each layer, and a deliverer is provided at an end on the relay block side in the layer including a pre-exposure treatment module. In the relay block, a second transfer-in/out module for the deliverer and a post-exposure treatment module is provided in a region adjacent, in the width direction, to the deliverer, the first transfer-in/out module is provided in a relay side transfer region extending in a depth direction from a region overlapping with the second transfer-in/out module, the post-exposure treatment module is provided in a region adjacent, in an up-down direction, to the relay side transfer region and adjacent, in the depth direction, to the second transfer-in/out module, and a relay mechanism is provided.

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Koshi, Japan

Ippei Hamada