Samsung Electronics Co., Ltd.

Insung Kim

Dohyung Kim

Jungchul Lee

Seongchul Hong

Jinhong Park

Taeik Kim

Hoyeon Kim

SeongSue Kim

Wooseok Kim

Jung-Hoon Lee

Sanghyeon Kim

Seulgi Lee

Ji Young Choi

Jinseok Heo

Jinho Jeon

Seungkoo Lee

Chanyoung Jeong

Kangyeop Choo

Kyungsik Kang

Woojeong Shin

Motoshi Sakai

Joomyoung Kim

Sunghyuck Lee

Hanhum Park

An electronic device including: a regulator circuit configured to output a regulated voltage based on a reference voltage and a feedback voltage; and an oscillator configured to generate an output frequency signal based on a reference frequency signal and the regulated voltage output from the regulator circuit, wherein the regulator circuit includes: a feedback loop configured to output the regulated voltage based on a difference between the reference voltage and the feedback voltage; a first capacitor; a precharge circuit connected to the feedback loop, and configured to charge the first capacitor with a second voltage which is based on a first voltage; a first switch configured to connect the precharge circuit with the first capacitor; and a second switch configured to connect the first capacitor with the feedback loop.

Regulator circuit, an electronic device including the regulator circuit, and a processor including the regulator circuit

Disclosed are semiconductor manufacturing apparatuses and operating methods thereof. The semiconductor manufacturing apparatus includes an oscillation unit that includes a first seed laser, a second seed laser, and a seed module, wherein the first seed laser oscillates a first pulse, and wherein the second seed laser oscillates a second pulse, and an extreme ultraviolet generation unit configured to use the first and second pulses to generate extreme ultraviolet light. The seed module includes a plurality of mirrors configured to allow the first and second pulses to travel along first and second paths, respectively, and a pulse control optical system including a first optical element, a second optical element, and a third optical element. The pulse control optical system is on the second path that does not overlap the first path. The third optical element includes a lens between the first optical element and the second optical element.

Semiconductor manufacturing apparatus and operating method thereof

Disclosed are semiconductor device fabricating method and semiconductor device fabricated by the same. The method includes forming on a lower mask layer first upper mask patterns and sacrificial spacers that cover sidewalls of the first upper mask patterns, forming first holes in the lower mask layer below the first upper mask patterns, forming second holes in the lower mask layer not covered by the first upper mask patterns and the sacrificial spacers, forming second upper mask patterns filling a space between the sacrificial spacers on the lower mask layer and also forming sacrificial patterns filling the first and second holes, removing the sacrificial spacers, using the first and second upper mask patterns to etch the lower mask layer, and removing the sacrificial patterns.

Semiconductor device and method of fabricating the same

A laser beam delivery apparatus of an extreme ultra violet light source may include a high power seed module configured to generate a laser beam, a power amplifier configured to amplify the laser beam generated by the high power seed module, a beam transfer module configured to collect and move the laser beam amplified by the power amplifier, a final focusing assembly optical platform configured to adjust focus of the laser beam collected and moved by the beam transfer module, and a focusing unit configured to focus the laser beam with the focus adjusted by the final focusing assembly optical platform to a target droplet. The power amplifier may include a position adjuster configured to adjust a position of the laser beam. The position adjuster may include a refraction plate having a flat surface. The power amplifier may include a pointing adjuster, which may include a mirror.

Laser beam delivery apparatus for extreme ultra violet light source

A phased locked loop includes; a load circuit that generates an output signal in response to a driving voltage, a frequency calibration circuit that generates a calibration signal in response to an output frequency of the output signal and a target frequency, and a regulator that generates the driving voltage in response to the calibration signal.

Phase locked loop generating adaptive driving voltage and related operating method

Provided is a reflective photomask including a substrate, and a reflective layer formed on the substrate. The reflective layer includes at least one recessed portion. An absorbing layer is formed in the recessed portion. The absorbing layer includes at least one absorbent and at least one polymer.

Reflective photomask, method of fabricating the same, and exposure apparatus using the reflective photomask

A reticle including a mask and an edge cover may be provided. The mask may include a mask substrate and mask patterns on the mask substrate. The edge cover may be coupled to an edge of the mask substrate and may include a floating cover part. The floating cover part may be spaced apart from the mask patterns while extending from a sidewall of the mask substrate over the mask patterns.

Reticle and exposure apparatus including the same

An extreme ultraviolet generation device, including a chamber with an internal space; a plasma generator to generate plasma in the internal space; a condenser in the internal space to gather light generated from the plasma; and a monitor to monitor the internal space in an omnidirectional manner.

Extreme ultraviolet generation device and exposure system including the same

Described is an extreme ultraviolet (EUV) light generator apparatus. The EUV light generator apparatus includes a droplet nozzle, a central electromagnet including a central coil wound around the droplet nozzle, and a droplet generator including side electromagnets around the central electromagnet.

EUV light generator apparatus having a droplet generator configured to control a droplet position using a magnetic field

An extreme ultraviolet light (EUL) source device is disclosed, the device comprising: a chamber in which a gas flow and a droplet stream are provided; a droplet generator through which target material is changed into the droplet stream; and a shroud positioned along the droplet stream, the shroud shielding the droplet stream from the gas flow, wherein the droplet stream is irradiated by laser to produce plasma and generate an extreme ultraviolet light. The shroud includes flow guide surface features that guide accumulated target material away from a collector mirror that reflects and focuses the EUL.

Growing community of inventors

Seongnam-si, South Korea

Insung Kim