Aether Inc.

Inshik Bae

Sang Won Lee

Jaehyun Kim

One aspect of the present invention relates to a device for managing a fine particle concentration of a target region by supplying charges to a target region, the device comprising: a container configured to store liquid, at least one nozzle configured to output the liquid, a pump configured to supply the liquid from the container to the at least one nozzle, a power supply configured to supply power to the device, and a controller configured to supply the charges to the target region through the at least one nozzle by using the power supply, wherein the controller is configured to, by using the power supply, apply a voltage equal to or greater than a reference value to the at least one nozzle, and provide electric force in a direction away from the device to the fine particles in the target region charged by the supplied charges.

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Daejeon, South Korea

Inshik Bae