Samsung Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Inseol Kuk

Hongsick Park

Youngchul Park

Inho Yu

Youngjun Kim

Jong-Hyun Choung

Seon-Il Kim

In-Bae Kim

Youngjin Yoon

Giyong Nam

Daesung Lim

Soomin An

Seungsoo Lee

Jongmun Lee

Suckjun Lee

An etchant composition includes an etchant composition that includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.1 wt % to about 10 wt % of an aliphatic sulfonic acid, about 1 wt % to about 20 wt % of an organic acid or an organic acid salt, and water based on a total weight of the etchant composition.

Etchant composition and method of manufacturing a thin film transistor substrate by using the same

An etchant includes, based on a total amount of the etchant, from about 0.5 to about 20 wt % of a persulfate, from about 0.01 to about 2 wt % of a fluorine compound, from about 1 to about 10 wt % of an inorganic acid, from about 0.5 to about 5 wt % of an azole compound, from about 0.1 to about 5 wt % of an electron-donating compound, from about 0.1 to about 5 wt % of a chlorine compound, from about 0.05 to about 3 wt % of a copper salt, from about 0.1 to about 10 wt % of an organic acid or an organic acid salt, and a remaining amount of water.

Etchant and method for manufacturing display device using the same

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Iksan-si, South Korea

Inseol Kuk