Advanced Micro Devices Corporation

Inka Zienert

Thorsten E Kammler

Moritz-Andreas Meyer

Jochen Rinderknecht

Hartmut Prinz

By performing x-ray analysis of stacked metallization layers on the basis of data reduction, the crystalline structure of individual metallization layers may be determined. Consequently, a relationship between electromigration and crystallinity, as well as a correlation between process parameters and materials and the finally obtained crystalline structures of metal lines, may be estimated in a highly efficient manner compared to measurement techniques based on charged particles.

System and method for estimating the crystallinity of stacked metal lines in microstructures

According to an illustrative embodiment disclosed herein, a semiconductor structure comprising a first crystalline substrate and a second crystalline substrate is provided. The semiconductor structure is irradiated with a radiation. Both the first crystalline substrate and the second crystalline substrate are exposed to the radiation. At least one diffraction pattern of a crystal lattice of the first crystalline substrate and a crystal lattice of the second crystalline substrate is measured. A relative orientation of the crystal lattice of the first crystalline substrate and the crystal lattice of the second crystalline substrate is determined from the at least one diffraction pattern.

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Dresden, Germany

Inka Zienert