Asml Netherlands B.v.

Ingmar August Kerp

Hans Butler

Cornelius Adrianus Lambertus De Hoon

Jeroen Pieter Starreveld

Martinus Van Duijnhoven

Robertus Mathijs Gerardus Rijs

Marco Hendrikus Hermanus Oude Nijhuis

Olav Johannes Seijger

Edward Hage

Evert Hendrik Jan Draaijer

Pieter Johannes Gertrudis Meijers

Alexander Petrus Josephus Van Lankvelt

Derk Ten Hoopen

Richardus Simon Antonius Oostveen

Wesley Ooms

Alexander Maurice Steenhoek

The invention relates to a vibration isolation system (VIS) comprising: &#x2014;a base (); &#x2014;a coupling element () to be coupled to a vibration sensitive object; &#x2014;a vibration isolator (-) arranged between the base and the coupling element; &#x2014;a bellows () to be arranged between the VIS coupling element or the vibration isolator and a protective housing () surrounding the vibration sensitive object; and &#x2014;one or more separate damping elements to act on convolutions of the bellows.

Vibration isolation system and lithographic apparatus

A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.

Support device, lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Ingmar August Kerp