Merck Patent Gesellschaft MIT Beschrankter Haftung

Merck Gmbh

Ingeborg Stein

Ulrich Heywang

Roland Martin

Michael Schwarz

Michael Casutt

Thekla Kurz

Henning Bottcher

Hartmut Hartner

Ulrich Fechtel

Gerald Faller

Gunther Holzemann

Alexander Putz

J Urgen Eckstein

J&uuml;rgen Eckstein

The invention relates to ketotricyclo&lsqb;5.2.1.0&rsqb;-decane derivatives of the formula I

Ketotricyclo&lsqb;5.2.1.0&rsqb;decane derivatives

The invention relates to the use of .alpha.-hydroxyketoalkyl derivatives as light protection filters for cosmetic or pharmaceutical products, the .alpha.-hydroxyketoalkyl group being linked, if appropriate via a spacer, to a chromophoric group which has an absorption maximum in a wavelength range of between 280 and 400 nm and has a conjugated .pi.-electron system of at least 8 .pi.-electrons, and to new .alpha.-hydroxyalkyl derivatives, processes for their preparation and pharmaceutical and cosmetic formulations comprising these derivatives as light protection substances.

.alpha.-hydroxyketoalkyl derivatives as light protection filters

The invention relates to ketotricyclo[5.2.1.0]decane derivatives of the formula I ##STR1## wherein Phe is a phenyl group which is unsubstituted or substituted by 1 to 5 hydroxyl, alkyl or alkoxy groups having 1 to 10 C atoms,

Ketotricyclo[5.2.1.0]decane derivatives

Use of .alpha.-hydroxyketoalkyl derivatives as light protection filters

Triazine derivatives with UV filter properties

Use of benzimidazole derivatives as light protection filters

Process for preparing 2-arylbenzimidazole-5-sulfonic acids

The invention relates to benzylidene-quinuclidinone derivatives of the formula I ##STR1## in which R.sup.1 is A;

Benzylidenequinuclidinones

The invention relates to dialkoxybenzylidene-camphor derivatives of the formula I ##STR1## in which R.sup.1 and R.sup.2, in each case independently of one another, are a straight-chain or branched alkyl radical having 1 to 10 c atoms, and

Dialkoxybenzylidene-camphor derivatives

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Erzhausen, Germany

Ingeborg Stein