Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Centrotherm Photovoltaics Ag

Ines Dani

Volkmar Hopfe

Stefan Kaskel

Holger Althues

Harald Wanka

Thomas Abendroth

Wulf Grählert

Moritz Heintze

Milan Rosina

Rainer Moeller

Gerrit Mäder

Elena Lopez

Andrés Lasagni

A method for manufacturing photocatalytically active titanium dioxide layers on substrate surfaces. The method reduces the effort for the manufacture of photocatalytically active titanium dioxide layers and increases the choice for the coating of suitable substrate materials. In the method, a titanium compound present in the gas phase and water vapor are directed to a preheated substrate by means of gas phase hydrolysis and a titanium dioxide layer is foamed on the surface of the substrate by chemical reaction. In this respect, the titanium compound and water vapor are supplied separately from one another so that a flow speed of at least 0.5 m/s is achieved and the time between the first contact of the two gases up to the impact on the surface of the substrate is kept lower than 0.05 s, and in this process the photocatalytically active titanium dioxide layer is formed on the substrate surface.

Method for producing photocatalytically active titanium dioxide layers

The invention relates to a method for the one-sided removal of a doped surface layer on rear sides of crystalline silicon solar wafers. In accordance with the object set, doped surface layers should be able to be removed from rear sides of such solar wafers in a cost-effective manner and with a handling which is gentle on the substrate. In addition, the front side should not be modified. In accordance with the invention, an etching gas is directed onto the rear side surface of silicon solar wafers with a plasma atmospheric pressure.

Method for the removal of doped surface layers on the back faces of crystalline silicon solar wafers

The invention relates to a device and a method for the optical detection of substances contained in exhaust gases of chemical processes, wherein exhaust gases are conducted all the way through a channel element that forms an optical measuring section; at the channel element there are two flanges, closed off to the ambient area, and at least one window element through which electromagnetic radiation for the optical detection can be directed from a radiation source to a optical detector through the channel element; a purge gas is fed through the flanges into the channel element, whereby with a purge gas led into one of the flanges a closed laminar purge gas flow is to be formed in the bottom area of the interior of the channel element.

Device and method for optical detecting substances contained in waste gases of chemical processes

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Lichtenau, Germany

Ines Dani