Intel Corporation

Inane Meric

Christopher J Jezewski

Flavio Griggio

Radek P Chalupa

Jiun-Chan Yang

Methods/structures of forming substrate tap structures are described. Those methods/structures may include forming a plurality of conductive interconnect structures on an epitaxial layer disposed on a substrate, wherein individual ones of the plurality of conductive interconnect structures are adjacent each other, forming a portion of a seed layer on at least one of the plurality of conductive interconnect structures, and forming a conductive trace on the seed layer.

Growing community of inventors

Hillsboro, OR, United States of America

Inane Meric