Samsung Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

In Seol Kuk

Hong-Sick Park

Jong-Hyun Choung

Wang Woo Lee

Sang-tae Kim

Young-Chul Park

Seon-Il Kim

In-Bae Kim

In-Ho Yu

Suck-Jun Lee

Joon-Woo Lee

Sang-Hoon Jang

Young-Jun Jin

Young-Jin Yoon

Jae-Woo Jeong

Keyong Bo Shim

Seung Bo Shim

Dong Hee Lee

Jin Suek Kim

Beom Soo Kim

Bong Kyun Kim

Sang Tae Kim

Young Chul Park

Seung Hee Kim

Young Jin Yoon

Shin Hyuk Choi

Dae Sung Lim

An etchant composition may include: a peroxosulfate; a cyclic amine compound; a first amphoteric compound including a carboxyl group; and a second amphoteric compound including a sulfone group, wherein the second amphoteric compound may be different from the first amphoteric compound.

Etchant composition and method of manufacturing wiring substrate using the same

A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.

Etchant composition and method of forming metal wire and thin film transistor array panel using the same

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Iksan-si, South Korea

In Seol Kuk