Lg Display Co., Ltd.

In Sang Jung

Sung Hoon Kim

Kum Mi Oh

Discussed is a method of manufacturing a LCD device, the method including: forming a gate in each of a plurality of pixel areas on a substrate; forming a gate insulator to cover the gate; forming a semiconductor layer on the gate insulator, and forming a photoresist (PR) on the semiconductor layer; doping high-concentration impurities at the semiconductor layer by using the photoresist (PR) as a mask to form an active layer, a source, and a drain; and doping low-concentration impurities at the semiconductor layer by using the photoresist (PR) as the mask to form a lightly doped drain (LDD) between the active layer and the source and between the active layer and the drain.

Method of manufacturing liquid crystal display device using first and second photoresists

Discussed are a liquid crystal display (LCD) device and a method of manufacturing the LCD device. The LCD device can include a plurality of pixel areas defined by intersections of a plurality of gate lines and a plurality of data lines, a gate disposed in each of the plurality of pixel areas, a gate insulator disposed to cover the gate, an active layer disposed on only the gate with the gate insulator therebetween, a thin film transistor (TFT) configured to include a source, which is disposed at a first side of the active layer, and a drain disposed at a second side of the active layer, a pixel electrode connected to the drain of the TFT and configured to supply a data voltage to a corresponding pixel area, a common electrode configured to supply a common voltage to the corresponding pixel area, and a lightly doped drain (LDD) disposed between the active layer and the source and between the active layer and the drain. At least a portion of the LDD can be disposed on the gate.

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Paju-si, South Korea

In Sang Jung