Samsung Electronics Co., Ltd.

In Keun Baek

Tae-Heung Ahn

Jong Min Yoon

Nam Il Koo

Racine Nassau

Ik Seon Jeon

Ki Wan Seo

Su Hwan Park

Provided is an apparatus for measuring a wafer. The apparatus may include a chuck disposed on a stage and a plate connected with the stage, a horizontal frame configured to support a wafer, and a vertical frame connecting the plate and the horizontal frame. The apparatus may further include first to third adsorption portions connected with the horizontal frame and configured to adsorb the wafer, a support bar penetrating through the chuck and extending in a first direction and a beam irradiator connected to the support bar and disposed between the plate and the horizontal frame. The beam irradiator may be configured to irradiate a beam on the wafer. The apparatus may further include a detector on an opposite side of the horizontal frame from the beam irradiator and configured to receive the beam after it has penetrated through the wafer.

Apparatus for measuring wafer

Growing community of inventors

Suwon-si, South Korea

In Keun Baek