Hyundai Electronics Industries Co. Ltd.

Lg Semicon Co., Ltd.

In Jae Park

Chang Jae Kim

Dong Hyun Kang

Seung Yoon Yang

Jong Woo Yoon

Jong Sik Kim

Tanigawa Eiki

Seong Jae Park

A gas injection system for a chemical vapor deposition device includes a gas providing pipe providing gases into the system, a shower head unit coupled to the gas providing pipe for evenly injecting the gases on a wafer, and a temperature control unit coupled to the shower head unit for controlling a temperature of the shower head unit.

Gas injection system for chemical vapor deposition device

A heating apparatus for chemical vapor deposition equipment which is capable of providing a uniform temperature distribution, even for a wafer having a large surface area. The heating apparatus may include upper and lower reflection plates, with a heater located between the reflection plates. The apparatus may also include a barrier plate to help provide a uniform heat distribution and to minimize dust generation and metallic pollution on a wafer. The apparatus may also include a heater cover for covering the upper portions of the first reflection plate, the heater and the barrier plate, and the sides thereof. The upper reflection plate, which is installed above the heater cover, may be integrally formed with a gas spraying means.

Heating apparatus for chemical vapor deposition equipment

Growing community of inventors

Choongcheongbuk-Do, South Korea

In Jae Park