Samsung Display Co., Ltd.

In-Do Chung

Jae-Beom Choi

Seong-Hyun Jin

Young-Jin Chang

Cheol-Ho Park

Hyung-Don Na

Ji-Hye Eom

Doo-Hyung Woo

Young-II Kim

Kwon-Hyung Lee

The present invention provides a display device and a method of driving the same. The display device includes: a light-emitting device; a first capacitor connected between a first contact point and a second contact point; a driving transistor including an input terminal connected to a first voltage, an output terminal, and a control terminal connected to the second contact point; a first switching transistor controlled by a first control signal and connected between a data voltage and the first contact point; a second switching transistor controlled by a second control signal and connected between a second voltage and the first contact point; a third switching transistor controlled by a third control signal and connected between the second contact point and the second voltage; a fourth switching transistor controlled by the first control signal and connected between the second contact point and the output terminal of the driving transistor; and a fifth switching transistor controlled by the second control signal and connected between the light-emitting device and the output terminal of the driving transistor.

Display device and method of driving the same

A crystallization method is disclosed. In one embodiment, the method includes providing a substrate having an amorphous silicon layer, wherein the substate has first and second sides opposing each other and irradiating a laser beam onto the substrate so as to have an inclined angle with respect to the first and second sides of the substrate. The method further includes relatively moving one of the laser beam and the substate with respect to the other i) in a first direction from the first side to the second side of the substate and ii) in a second direction which crosses the first direction.

Crystallization method of amorphous silicon layer

A mask for sequential lateral solidification (SLS) which is capable of preventing an overlapping region and a diagonal stain based on a crystallization pattern of an active layer. The mask for SLS, which moves in a first direction and selectively transmits a laser beam emitted by a laser emitting device, includes slits which are formed such that the width of a slit in the first direction is smaller than the width of the slit in a second direction, which is perpendicular to the first direction. Each of the slits is tilted by a predetermined angle with respect to the first direction.

Mask for sequential lateral solidification and sequential lateral solidification apparatus having the same

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Yongin, South Korea

In-Do Chung