Samsung Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

In-Bae Kim

Jong-Hyun Choung

Seon-Il Kim

Jae-Woo Jeong

Hong-Sick Park

Young-Chul Park

In-Ho Yu

Suck-Jun Lee

Young-Jin Yoon

Wang Woo Lee

Hong Sick Park

Ki-beom Lee

Sam-Young Cho

Sang-tae Kim

Sungsoon Im

Minho Moon

Ji-Young Park

Hongsick Park

Sang-Hoon Jang

Joon-Woo Lee

Young-Jun Jin

Gyu-po Kim

Won-guk Seo

Hyun-cheol Shin

Gi-Yong Nam

Seung-yeon Han

In Seol Kuk

In-Seol Kuk

Keyong Bo Shim

Sang-Gab Kim

Sang Gab Kim

Bong-Kyun Kim

Sang-woo Kim

Byeong-Jin Lee

Youngmin Moon

Kyuhwan Hwang

Youngho Park

Jae Woo Jeong

Young Min Moon

Dae-woo Lee

Ki Tae Kim

Giyong Nam

Youngchul Park

Seon-II Kim

Youngjin Yoon

Inseol Kuk

Inho Yu

Suckjun Lee

Provided is a mask assembly including a mask sheet including a pattern part with at least one opening part, and a welding part connected to the pattern part, and a mask frame with the mask sheet mounted thereon and welded to the welding part. The mask sheet includes a first surface configured to fact the mask frame and a second surface opposite to the first surface. The welding part includes a hatching area in which a surface roughness of the second surface is larger than that of the second surface in the pattern part.

Mask assembly with surface roughened mask sheet at welding location, method of manufacturing the same, and method of manufacturing display device using the same

A mask sheet and a method for manufacturing the same are provided. A mask sheet includes one or more openings defined therein, and an alloy of nickel and iron, and a particle of the alloy has a single crystalline structure. A method for manufacturing a mask sheet includes preparing a base sheet including an alloy of nickel and iron, performing a heat treatment on the entire base sheet; and forming one or more openings in the heat-treated base sheet.

Mask sheet and manufacturing method for the same

A touch screen panel and manufacturing method thereof are disclosed. In one aspect, the touch screen panel includes a substrate having a touch area and a peripheral area that surrounds the touch area and a plurality of first touch electrode patterns that are formed in the touch area, extend in a first direction, and are configured to transmit a first touch signal. The touch panel also includes a plurality of second touch electrode patterns that are formed in the touch area, extend in a second direction crossing the first direction, and are configured to transmit a second touch signal and a plurality of first driving circuit wirings that are formed in the peripheral area and are respectively electrically connected to the first touch electrode patterns. The first driving circuit wirings include a low resistance wiring layer.

Touch screen panel including touch electrode patterns and driving circuit wirings having a low resistance wiring layer and connected thereto and manufacturing method thereof

An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3 wt %; an organic acid or an organic acid salt from 0.1 to 10 wt %; an electron-donating compound from at 0.1 to 5 wt %; and a solvent of the residual amount. Also provided is a method of manufacturing a display device by using the same.

Etchant and method of manufacturing display device by using the same

A liquid crystal display includes: a substrate; a gate line and a data line disposed on the substrate; a semiconductor layer disposed on the substrate; first and second field generating electrodes disposed on the substrate; and a first protecting layer formed from the same layer as the first field generating electrode and covering at least a portion of the data line.

Liquid crystal display

A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.

Etchant composition and method of forming metal wire and thin film transistor array panel using the same

An etchant composition includes about 0.5 weight % to about 20 weight % of persulfate, about 0.01 weight % to about 2 weight % of a fluoride compound, about 1 weight % to about 10 weight % of an inorganic acid, about 0.5 weight % to about 5 weight % of a cyclic amine compound, about 0.1 weight % to about 10.0 weight % of a compound having an amino group and a sulfonic acid, about 0.1 weight % to about 15.0 weight % of an organic acid or a salt thereof, and water to 100 weight % of the etchant composition.

Etchant composition and method of manufacturing metal wiring and thin film transistor substrate using the etchant

An etchant composition including 0.5 wt % to 20 wt % of a persulfate, 0.01 wt % to 1 wt % of a fluorine compound, 1 wt % to 10 wt % of an inorganic acid, 0.01 wt % to 2 wt % of an azole-based compound, 0.1 wt % to 5 wt % of a chlorine compound, 0.05 wt % to 3 wt % of a copper salt, 0.01 wt % to 5 wt % of an antioxidant or a salt thereof, based on a total weight of the etchant composition, and water in an amount sufficient for the total weight of the etchant composition to be equal to 100 wt % is disclosed. The etchant composition is suitable for use in forming a metal wiring by etching a metal layer including copper or in fabricating a thin film transistor substrate for a display apparatus.

Etchant composition and methods of fabricating metal wiring and thin film transistor substrate using the same

An etching composition, a method of forming a metal pattern using the etching composition, and a method of manufacturing a display substrate are disclosed. The etching composition includes about 0.1% by weight to about 25% by weight of ammonium persulfate, about 0.1% by weight to about 25% by weight of an organic acid, about 0.01% by weight to about 5% by weight of a chelating agent, about 0.01% by weight to about 5% by weight of a fluoride compound, about 0.01% by weight to about 5% by weight of a chloride compound, about 0.01% by weight to about 2% by weight of an azole-based compound and a remainder of water. Thus, a copper layer may be stably etched to improve a reliability of manufacturing the metal pattern and the display substrate.

Etching composition, method of forming a metal pattern using the etching composition, and method of manufacturing a display substrate

An etchant includes, based on a total amount of the etchant, from about 0.5 to about 20 wt % of a persulfate, from about 0.01 to about 2 wt % of a fluorine compound, from about 1 to about 10 wt % of an inorganic acid, from about 0.5 to about 5 wt % of an azole compound, from about 0.1 to about 5 wt % of an electron-donating compound, from about 0.1 to about 5 wt % of a chlorine compound, from about 0.05 to about 3 wt % of a copper salt, from about 0.1 to about 10 wt % of an organic acid or an organic acid salt, and a remaining amount of water.

Etchant and method for manufacturing display device using the same

A metal wire etchant including persulfate, a sulfonate, a fluorine compound, an azole-based compound, an organic acid, a nitrate, and a chlorine compound, and a method of making the same.

Metal wire etchant and method of forming metal wire using the same

A method of forming a metal pattern on a display substrate includes blanket depositing a copper-based layer having a thickness between about 1,500 &#x212b; and about 5,500 &#x212b; on a base substrate, and forming a patterned photoresist layer on the copper-based layer. The copper-based layer is over-etched by an etching composition containing an oxidizing moderating agent where the over-etch factor is between about 40% and about 200% while using the patterned photoresist layer as an etch stopping layer, and where the etching composition includes ammonium persulfate between about 0.1% by weight and about 50% by weight, includes an azole-based compound between about 0.01% by weight and about 5% by weight and a remainder of water. Thus, reliability of the metal pattern and that of manufacturing a display substrate may be improved.

Method of forming a metal pattern and method of manufacturing a display substrate including the metal pattern

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Yongin-si, South Korea

In-Bae Kim