Aktiebolaget Skf

Carl Zeiss Gmbh

Ileana Nedelcu

Pieter Martin Lugt

Andrey E Yakshin

Eric Louis

Warrick Allen

Rihard Pasaribu

Albertus Maria Van Der Vorst

Robbert W E Van De Kruijs

Fred Bijkerk

Egidio D'Antona

A process for preparing a coating on at least part of a tribological surface of a first machine component which, during machine operation, is adapted to be in sliding contact with a tribological surface of a second machine component is provided. The process provides the steps of: (a) applying a polymer formulation onto at least part of the tribological surface of the first machine component to form a coating. The polymer formulation provides an isocyanate that contains two or more isocyanate groups per molecule and an idocyanate-reactive polyol to form polyurethanes; and (b) subjecting at least part of the coating as obtained in step (a) to a curing treatment during which polyurethanes are formed in the coating on the at least part of the tribological surface of the first machine component.

Process for preparing a coating

A system for investigating rheological properties of grease, the system including grease sample preparation arrangement for preparing a grease sample with a predetermined quantity of grease, at least two sample holder plates for holding the grease sample by sandwiching the grease sample between the sample holder plates, wherein at least one of the sample holder plates is transparent, and a loading system for generating a predetermined force acting on the grease sample sandwiched between the sample holder plates by pressing on the sample holder plates such that a spot formed by the grease sample on the sample holder plates is expanded. The loading system can include at least one transparent portion enabling a continuous observation of the expansion of the spot while the predetermined force is acting on the grease sample.

System and method for assessing rheological properties of grease

A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer () and a second additional intermediate layer () are provided between the absorber layer () and the spacer layer (), wherein the first additional intermediate layer increases the reflectivity and the second additional intermediate layer () prevents chemical interaction between the first additional intermediate layer () and the adjoining spacer layer () and/or the absorber layer ().

Reflective optical element for EUV lithography device

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Nieuwegein, Netherlands

Ileana Nedelcu