Samsung Display Co., Ltd.

Ilbae Ahn

Bong-Kyun Kim

Sang-woo Kim

Hyun-Cheol Shin

Seungbo Shim

Jinsuek Kim

Gyu-po Kim

Changwoo Kwon

Seokjun Jang

Ji-hun Park

Yong-su Lee

Yangil Jeon

An etchant composition of an embodiment may etch a multi-layered film of titanium/copper and may include about 5 wt % to about 20 wt % of persulfate, about 0.1 wt % to about 5 wt % of phosphoric acid or phosphate, about 0.01 wt % to about 2 wt % of a carbonyl ring compound, about 0.01 wt % to about 1 wt % of a 3-nitrogen ring compound, about 0.1 wt % to about 2 wt % of a 4-nitrogen ring compound, about 0.1 wt % to about 0.9 wt % of a fluorine compound, about 0.1 wt % to about 0.5 wt % of hydrogen about 1 wt % to about 3 wt % of a zwitterionic compound, and sulfate, water which is included in an amount that makes the total weight of the entire composition about 100 wt %.

Etchant composition, and method for manufacturing metal pattern and thin film transistor substrate using the same

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Asan-si, South Korea

Ilbae Ahn