Intel Corporation

Iscar, Ltd.

Plasan Sasa Ltd.

Ilan Gavish

Yuval Greenzweig

Amir Ben Shoshan

Shmuel Genihovich

Amit Viesel

An armor element configured to be employed within the armor module, the armor element being formed with a base portion and a claw portion. The armor element has a longitudinal axis oriented substantially perpendicular to the base portion, the claw portion comprising two or more claw members extending from the base portion generally along a longitudinal direction defined by the longitudinal axis. Each claw member has a rear end associated with the base portion and a front end spaced from the base portion. The claw members are tapered with respect to the longitudinal axis so that the distance between the corresponding front ends of the two or more claw members is greater than the distance between the rear ends of the two or more claw members.

Armor element and an armor module comprising the same

Introducing at least one metal such as cobalt, molybdenum, metal carbonyl, tungsten, platinum, or other suitable metal to a focused ion beam. Introducing the focused ion beam to a substrate within a processing chamber. Forming at least one layer over a substrate. Applying heat to the layer by, for example, a laser.

Focused ion beam deposition

Disclosed is a layer to electrically connect targets during a circuit edit of an integrated circuit and systems and methods for forming the layer. The layer contains a conductive material, such as gold or another metal, which has been physically deposited by sputtering, thermal evaporation, and other physical deposition technique.

Physically deposited layer to electrically connect circuit edit connection targets

One embodiment of the invention involves introducing at least two metals into a chamber for forming an alloy layer over a substrate. This is accomplished by a variety of methods. In one embodiment, at least two metals are mixed and introduced into a chamber in which a focused ion beam contacts the two metals to form at least one alloy layer over a substrate. In another embodiment, at least two precursor gas sources are introduced into the chamber in which each precursor gas source contains a metal. The focused ion beam contacts the two precursor gases to form an alloy layer over the substrate. In yet another embodiment, a second metal layer is formed over a first metal layer to form a multi-metal layer. Thereafter, thermal treatment or introducing a focused ion beam to at least a portion of the multi-metal layer is performed to create at least one alloy layer over the substrate.

Apparatus and a method for forming an alloy layer over a substrate

Apparatus and a method for forming an alloy layer over a substrate using an ion beam

Focused ion beam metal deposition

A sinterable powder mix for the production of a tungsten-based cemented carbide material, said powder mix comprising at least 70% by weight of WC, from about 2 to about 15% by weight of an iron group metal binder, and optionally up to about 15% by weight of one or more carbides, nitrides and carbonitrides of metals of the groups IVb, Vb and VIb of the periodic table; characterized in that

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Karmiel, Israel

Ilan Gavish