Skhynix Inc.

Micron Technology Incorporated

Hynix Semiconductor Inc.

Il Young Kwon

Jin Ho Bin

Ki Hong Lee

Seung Ho Pyi

Il Do Kim

Hye Hyeon Byeon

A semiconductor device includes a stack structure including conductive layers and insulating layers, which are alternately stacked; an opening including a first opening penetrating the stack structure and second openings protruding from the first opening; and a channel layer including channel regions located in the second openings and impurity regions located in the first opening, the impurity regions having an impurity concentration higher than that of the channel regions.

Semiconductor device and manufacturing method thereof

A method of manufacturing a non-volatile memory device includes forming a gate insulation layer on a semiconductor substrate having a source layer. The method also includes forming a silicon nitride layer having a buffer-treated upper surface on the gate insulation layer, wherein the buffer-treated upper surface of the silicon nitride layer has a hardness higher than a hardness of the silicon nitride layer. The method further includes forming a silicon oxide layer on the buffer-treated upper surface of the silicon nitride layer. The method additionally includes alternately forming additional silicon nitride layers and additional silicon oxide layers on the silicon oxide layer to form a stack structure.

Method of forming thin layers and method of manufacturing a non-volatile memory device using the same

A 3D structured nonvolatile semiconductor memory devices and methods for manufacturing are disclosed. One such device includes an n+ region at a source/drain region; a p+ region at the source/drain region; and a diffusion barrier material between the n+ region and the p+ region. The n+ region is substantially isolated from the p+ region.

Three-dimensional structured memory devices

A semiconductor device includes a substrate, and a gate line, located over the substrate, which includes a first conductive layer and one or more second conductive pattern layers located in the first conductive layer. The second conductive pattern layer comprises a metal layer to thus reduce resistance of a gate line.

Semiconductor device and method of manufacturing the same

A semiconductor memory device includes a first dummy transistor coupled to a bit line, a first select transistor formed where a first selection line surrounds a vertical channel layer, a second dummy transistor coupled to a common source line, a second select transistor formed where a second selection line surrounds the vertical channel layer, and main cell transistors coupled between the first and second select transistors.

Semiconductor memory device and system having the same

3D structured memory devices and methods for manufacturing thereof

In an erase method of a flash device, including a page buffer configured to transfer a virtual voltage in response to a discharge signal and further comprising strings each including memory cells and coupled to the page buffer via a respective bit line, applying a ground voltage to a gate of each of the memory cells and erasing the memory cells coupled to a selected bit line by supplying the virtual voltage wherein the virtual voltage is applied to the selected bit line and a unselected bit line.

Erase method of flash device

A method of manufacturing semiconductor devices, including the steps of forming an insulating layer on a semiconductor substrate in which predetermined structures are formed, and etching the insulating layer to expose a predetermined region of the semiconductor substrate, thereby forming a contact hole, forming an insulating layer on the sides of the contact hole, and forming a conductive layer within the contact hole, forming a contact plug. It is possible to prevent a short problem by sufficiently securing a distance between a drain contact plug and a virtual power line.

Growing community of inventors

Seoul, South Korea

Il Young Kwon