Hitachi, Ltd.

Fujitsu Hitachi Plasma Display Limited

Other

Toppan Printing Co., Ltd.

Ikuo Ozaki

Yoshimi Kawanami

Yusuke Yajima

Keizo Suzuki

Yoshihiro Nakagawa

Hiroshi Kajiyama

Masayuki Shibata

Norihiro Uemura

Koji Ohira

Takeo Tomatsuri

Kiichiro Hirose

Yukie Sato

Tamami Ohzeki

A plasma display panel and an imaging device realize a high luminous efficiency, a long lifetime and stable driving. The plasma display panel uses a discharge-gas mixture containing at least Xe, Ne and He. A Xe proportion of the discharge-gas mixture is in a range of from 2% to 20%, a He proportion of the discharge-gas mixture is in a range of from 15% to 50%, the He proportion is greater than the Xe proportion, and a total pressure of the discharge-gas mixture is in a range of from 400 Torr to 550 Torr. A width of a voltage pulse to be applied to an electrode serving as an address electrode is 2 &#x3bc;s or less.

Plasma display panel and imaging device using the same

There are provided a plasma display panel and an imaging device which realize a high luminous efficiency, guaranteed long lifetime and stable driving. The plasma display panel uses a discharge-gas mixture containing at least Xe, Ne and He. A Xe proportion of the discharge-gas mixture is in a range of from 2% to 20%, a He proportion of the discharge-gas mixture is in a range of from 15% to 50%, the He proportion is greater than the Xe proportion, and a total pressure of the discharge-gas mixture is in a range of from 400 Torr to 550 Torr. A width of a voltage pulse to be applied to an address electrode is 2 &mgr;s or less.

A process for sterilizing a material contained in a sealed microwave permeable package which is stored, under normal pressure, in a heat resisting and pressure resisting support during microwave irradiation. The heat resisting and pressure resisting support is conveyed on a conveyor belt into a plurality of microwave heating chambers in which local heating waveguides are provided in close proximity to the heat resisting and pressure resisting support and overall heating waveguides are provided at the wall of the microwave heating chambers. The heat resisting and pressure resisting support with the package is alternately irradiated by the local heating waveguides and the overally heating waveguides during conveyance through the microwave heating chambers so as to effect the substantially uniform heating of the material in the package. To regulate the degree to which the peripheral portions of the package are heated, the distance between the local heating waveguides and the package can be adjusted. To further facilitate the substantially uniform heating of the material in the package, the heat resisting and pressure resisting support containing the package can be inverted during conveyance.

Microwave irradiating sterilization process

Growing community of inventors

Higashimorokata, Japan

Ikuo Ozaki