Hitachi Chemical Company, Ltd.

Ikuo Mukai

Naoki Sasahara

Hiroshi Yamazaki

Yasuharu Murakami

Yoshimi Igarashi

Hiroyuki Tanaka

Seiji Tai

Takeshi Nojiri

Seikichi Tanno

Naoki Kimura

Hajime Kakumaru

Kazuya Sato

Hideyasu Tsuiki

Yumiko Wada

Toranosuke Ashizawa

Toshihiko Takasaki

Masami Ochiai

Mayumi Sato

Koji Abe

Kazuya Satou

Kouji Suzumura

Yasuhiro Seri

Manami Kiryu

Ikue Mitani

The method for forming a resin cured film pattern according to the invention comprises a first step in which there is formed on a base material a photosensitive layer composed of a photosensitive resin composition comprising a binder polymer with a carboxyl group having an acid value of 75 mgKOH/g or greater, a photopolymerizable compound and a photopolymerization initiator, and having a thickness of 10 &#x3bc;m or smaller, a second step in which prescribed sections of the photosensitive layer are cured by irradiation with active light rays, and a third step in which the sections of the photosensitive layer other than the prescribed sections are removed to form a cured film pattern of the prescribed sections of the photosensitive layer, wherein the photosensitive resin composition comprises an oxime ester compound and/or a phosphine oxide compound as the photopolymerization initiator.

Method for forming resin cured film pattern, photosensitive resin composition, photosensitive element, method for producing touch panel, and resin cured film

In the method for forming a protective coat on an electrode for a touch panel according to the invention, a photosensitive layer comprising a photosensitive resin composition containing a binder polymer having a carboxyl group and an acid value of 30 to 120 mgKOH/g, a photopolymerizable compound having at least three ethylenic unsaturated groups, and a photopolymerization initiator, is formed on a base material having an electrode for a touch panel, prescribed sections of the photosensitive layer are cured by irradiation with active light rays and then the sections other than the prescribed sections are removed, to form a protective coat comprising the cured sections of the photosensitive resin composition covering all or a portion of the electrode.

Method of forming protective film for touch panel electrode photosensitive resin composition and photosensitive element, and method of manufacturing touch panel

A photosensitive elementcomprises a support film, a protective film (polypropylene film), and a photosensitive layerwhich is arranged between the support filmand the protective film, wherein the protective filmhas a principal surfaceat a side of the photosensitive layerand a principal surfaceat an opposite side of the principal surface, and the principal surfaceand the principal surfaceare smooth.

Photosensitive element, photosensitive element roll, method for producing resist pattern, and electronic component

Method of forming protective film for touch panel electrode, photosensitive resin composition and photosensitive element, and method of manufacturing touch panel

Provided are a photosensitive resin composition capable of being quickly cured by light and providing an optically cured product which is excellent in a transparency in a visible light of 400 to 780 nm and a heat resistant reliability, a photosensitive resin varnish, a photosensitive resin film and a photosensitive resin cured product. The photosensitive resin composition comprises (A) a polymerizable compound, (B) a polymerization initiator and (C) a hindered phenol base antioxidant, wherein (B-1) at least one selected from &#x3b1;-hydroxyacetophenone base photoinitiator and a glyoxy ester base photoinitiator and (B-2) a phosphine oxide base photoinitiator are contained as the component (B); the component (C) is a hindered phenol base antioxidant having in a molecule, at least one phenol group having each one group of a methyl group and a t-butyl group on the same aromatic ring; a content of the component (B) is 0.02 to 4.0 parts by mass based on 100 parts by mass of the component (A); and a content of the component (C) is 0.01 to 1 part by mass based on 100 parts by mass of the component (A).

Photosensitive resin composition, photosensitive resin varnish, photosensitive resin film, and photosensitive resin cured product

Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9&times;L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4&times;L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.

Photosensitive element for preparing a phosphor pattern

Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same

Process for preparing phosphor pattern, phosphor pattern prepared the same and back plate for plasma display panel

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Hitachi, Japan

Ikuo Mukai