Hitachi-kokusai Electric Inc.

Ikuo Hirose

Kazuyuki Toyoda

Tadashi Takasaki

Takafumi Sasaki

Tetsuo Yamamoto

Kazuhiro Morimitsu

Kenji Ono

Generation of byproducts is inhibited in a buffer space even in a single-wafer-type apparatus using the buffer space. A method of manufacturing a semiconductor device includes (a) loading a substrate into a process chamber; (b) supplying a first-element-containing gas via a buffer chamber of a shower head to the substrate placed in the process chamber; (c) supplying a second-element-containing gas to the substrate via the buffer chamber; and (d) performing an exhaust process between (b) and (c), wherein (d) includes: exhausting an atmosphere of the buffer chamber; and exhausting an atmosphere of the process chamber after exhausting the atmosphere of the buffer chamber.

Growing community of inventors

Toyama, Japan

Ikuo Hirose