Samsung Sdi Co., Inc.

Samsung Display Devices Co., Ltd.

Ik-Chul Lim

Seung-Joon Yoo

Beom-Wook Lee

Jae-Woo Bae

Young-Suk Cho

Yong-soo Choi

Chang-wook Kim

Ki-wook Kang

Seung-joon Yoo

Young-Jong Kang

Eun-Ha Hoh

A polymer for a chemically amplified negative photoresist and a photoresist composition are provided. A representative polymer of the invention is a compound of formula 5:

Chemically amplified negative photoresist, and photoresist composition

Monomer and polymer for photoresist, photoresist composition, and phosphor layer composition for color cathode ray tube

A filming solution contains a copolymerized emulsion having more than 70 wt % of butyl methacrylate and more than one species of monomer, and more than one species of additive. Preferably, the monomer is selected from the group consisting of acrylic acid derivative, methacrylic acid derivative, styrene, acrylamide, and acrylonitrile.

Filming solution and method for forming a filming layer on a cathode ray tube

A photoresist composition containing a photo-curing polymer and a photosensitive agent, wherein the photosensitive agent comprises at least two compounds selected from the group consisting of 4,4'-diazido-2,2'-stilbenedisulfonate sodium salt, 4,4'-diazo-2,2'-dibenzalacetone disulfonate disodium salt, 2,5-bis(4-azido-2-sulfobenzylidene) cyclopentanone disodium salt and 4,4'-diazido-2,2'-dicinnamylideneacetone sulfonate salt. By performing a lithography process using the photoresist composition, the exposure time can be shortened, thereby improving the yield of products.

Photoresist composition

Growing community of inventors

Suwon, South Korea

Ik-Chul Lim