Samsung Electronics Co., Ltd.

Ihun Song

Sunil Kim

Sangwook Kim

Jaechul Park

Changjung Kim

Sungho Park

Huaxiang Yin

Youngsoo Park

Kiha Hong

A method of operating inverter may include providing a load transistor and a driving transistor connected to the load transistor wherein at least one of the load transistor and the driving transistor has a double gate structure, and varying a threshold voltage of the at least one of the load transistor and the driving transistor having the double gate structure. A threshold voltage of the load transistor or the driving transistor may be adjusted by the double gate structure, and accordingly, the inverter may be an enhancement/depletion (E/D) mode inverter.

Method of operating inverter

A transistor, a semiconductor device including the transistor and methods of manufacturing the same are provided, the transistor including a threshold voltage adjusting layer contacting a channel layer. A source electrode and a drain electrode contacting may be formed opposing ends of the channel layer. A gate electrode separated from the channel layer may be formed. A gate insulating layer may be formed between the channel layer and the gate electrode.

Transistor, semiconductor device including a transistor and methods of manufacturing the same

A transistor, an inverter including the transistor, and methods of manufacturing the inverter and the transistor. A gate insulating layer of the transistor has a charge trap region. A threshold voltage may be moved in a positive (+) direction by trapping charges in the charge trap region. The transistor may be an enhancement mode oxide thin-film transistor (TFT) and may be used as an element of the inverter.

Transistor, inverter including the same and methods of manufacturing transistor and inverter

Provided are an inverter, a method of operating the inverter, and a logic circuit including the inverter. The inverter may include a load transistor and a driving transistor, and at least one of the load transistor and the driving transistor may have a double gate structure. A threshold voltage of the load transistor or the driving transistor may be adjusted by the double gate structure, and accordingly, the inverter may be an enhancement/depletion (E/D) mode inverter.

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Seongnam-si, South Korea

Ihun Song