Lambda Physik Ag

Coherent, Inc.

Coherent Lasersystems Gmbh & Co. Kg

Coherent Lasersystems Gmbh & Co., Lg

Igor Bragin

Uwe Stamm

Vadim Berger

Ulrich Rebhan

Sergei V Govorkov

Juergen Kleinschmidt

Dirk Basting

Wolfgang Zschocke

Rainer Paetzel

Klaus Wolfgang Vogler

Hans-Stephan Albrecht

Thomas Schroeder

Rustem Osmanow

Andreas Targsdorf

Jürgen Bäumler

Michael Semling

Oleg Melnikov

Timur Misyuryaev

Paul Van Der Wilt

Rainer Desor

Alexander O Wiessner

Konstantin Aab

Juergen Baumler

Andriy N Knysh

Ivan Tassy-Julien

Gerhard Ahlborn

Fine-structure in the transverse mode of an excimer laser beam is minimized by having a plurality of resonator mirrors located at each end of a linear excimer laser. At one end, a highly-reflective end mirror and a partially-reflective end mirror are inclined at small angle with respect to each other. At the other end, two output-coupling mirrors are inclined at a small angle with respect to each other. This arrangement of resonator mirrors generates a composite laser beam that blurs any fine structure.

Excimer laser with uniform beam

Excimer laser annealing apparatus includes and excimer laser delivering laser-radiation pulses to a silicon layer supported on a substrate translated with respect to the laser pulses such that the consecutive pulses overlap on the substrate. The energy of each of the laser-radiation pulses is monitored, transmitted to control-electronics, and the energy of a next laser pulse is adjusted by a high-pass digital filter.

Energy controller for excimer-laser silicon crystallization

A xenon chloride (XeCl) excimer laser includes a lasing-gas mixture including a buffer gas, a noble gas, a halogen-donating gas, and deuterium. The deuterium is present in a concentration greater than about 10 parts-per-million.

Lasing-gas mixture for excimer laser

An electrical capacitor includes a dielectric spacer. Metal electrodes are held in contact with opposite surfaces of the dielectric spacer by magnetic force.

Capacitor assembly

Arcing is minimized in a discharge chamber of a gas laser system by utilizing an electrode which comprises a surface portion capable of functioning as one of an anode and a cathode in order to energize a gas mixture in a discharge chamber of the gas discharge laser system, a shoulder portion being positioned on either side of the surface portion and being exposed to the gas mixture, and a coating layer made of electrically insulating material, wherein the coating layer is attached to the shoulder portion by a cold spraying method.

Electrodes for generating a stable discharge in gas laser systems

A gas discharge laser includes elongated discharge electrodes having an active surface width that varies along the length of the resonator. In one example each of the electrodes is formed by a row of pins having a circular active surface. The pins are diametrically aligned with the active surfaces generally coplanar.

Gas laser electrodes shaped in the longitudinal axis

Electrodes for generating a stable discharge in gas laser system

A Master Oscillator (MO)&#x2014;Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.

Excimer or molecular fluorine laser system with precision timing

Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas injections including molecular fluorine can increase the partial pressure of molecular fluorine by a selected amount. The injections can be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure. The amount per injection and/or the interval between injections can be varied, based on factors such as driving voltage and a calculated amount of molecular fluorine in the discharge chamber. The driving voltage can be in one of multiple driving voltage ranges that are adjusted based on system aging. Within each range, gas injections and gas replacements can be performed based on, for example, total applied electrical energy or time/pulse count.

Laser gas replenishment method

Pulse parameters of a gas discharge laser system can be optimized and controlled for precision applications such as microlithography. Important laser pulse parameters typically vary in the beginning of a pulse burst, and the directionality of the output beam typically varies throughout the burst. In order to improve the performance of the laser system, the variation at the beginning of a pulse burst can be eliminated by extending the pulse pattern and shuttering the output during periods of significant parameter variation. A fast shutter such as an acousto-optical modulator can be used to prevent output during the burst transition processes. Elements such as acousto-optical cells also can be used in combination with a fast position sensor to steer the direction of the output beam, in order to adjust for variations in the direction of the beam between pulses in a burst.

Master oscillator/power amplifier excimer laser system with pulse energy and pointing control

Arcing can be minimized in a discharge chamber of an excimer or molecular fluorine laser system by utilizing an improved electrode structure. An electrode structure can include at least one ceramic spoiler positioned near the discharge region of the electrode. An insulating ceramic spoiler can reduce the effective area over which arcing can occur, and can reduce the likelihood of arcing by improving the flow of gas between the electrodes, such as by allowing for design flexibility and reducing the necessary height of a nose portion used to control the discharge area of the electrode. An improved blower design, which can utilize improved bearings and a dry film lubricant, can help to circulate the laser gas between the electrode structures, such as at a speed of at least 30 m/s in order to operate the laser at repetition rates of 4 kHz or higher.

Systems and methods utilizing laser discharge electrodes with ceramic spoilers

Precise timing control can be obtained for a gas discharge laser, such as an excimer or molecular fluorine laser, using a timed trigger ionization. Instead of using a standard approach to control the timing of the emission or amplification of an optical pulse using the discharge of the main electrodes, the timing of which can only be controlled to within about 10 ns, a trigger ionization pulse applied subsequent to the charging of the main electrodes can be used to control the timing of the discharge, thereby decreasing the timing variations to about 1 ns. Since ionization of the laser gas can consume relatively small amounts of energy, such a circuit can be based on a fast, high-voltage, solid state switch that is virtually free of jitter. Trigger ionization also can be used to synchronize the timing of dual chambers in a MOPA configuration. In one such approach, ionization trigger can include at least a portion of the optical pulse from the oscillator in a MOPA configuration.

Excimer or molecular fluorine laser with several discharge chambers

A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a molecular fluorine component of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is provided at an initial partial pressure and is subject to depletion within the laser discharge chamber. Injections of gas including molecular fluorine are performed each to increase the partial pressure of molecular fluorine by a selected amount in the laser chamber preferably less than 0.2 mbar per injection, or 7% of an amount of Falready within the laser chamber. A number of successive injections may be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the molecular fluorine in the discharge chamber. The driving voltage is preferably determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.

Method and system for providing stabilization techniques for high repetition rate gas discharge lasers with active loads provided in the discharge circuitry design which may include a resistance provided in the discharge circuitry.

Stabilization technique for high repetition rate gas discharge lasers

A final stage capacitance of a pulse compression circuit for an excimer or molecular fluorine lithography laser system is provided by a set of peaking capacitors connected through a first inductance to the electrodes and a set of sustaining capacitors connected to the electrodes through a second inductance substantially greater than the first inductance. Current pulses through the discharge are temporally extended relative to current pulses of a system having its final stage capacitance provided only by a set of peaking capacitors connected to the electrodes via the first inductance. An amplified spontaneous emission (ASE) level in the laser pulses is reduced thereby enhancing their spectral purity.

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Goettingen, Germany

Igor Bragin