Soleras Advanced Coatings Bv

Ignacio Caretti Giangaspro

Wilmert De Bosscher

Ivan Van De Putte

Guy Gobin

Freddy Fack

Wilmert Cyriel Stefaan De Bosscher

David Karel Debruyne

Hubert Eliano

Tom Cottens

A method of depositing a layer on a piece by sputter deposition, a coater and a processor for controlling a coater in accordance with the method are provided. The method includes providing deposition of metallic and reactive species simultaneously on a piece for forming a layer under predetermined sputtering conditions, thereby providing a deposited layer on the piece comprising a metal compound. The deposited layer is subsequently irradiated and the optical transmittance is measured. A measured parameter related to the measured radiation is compared with one stored value of that parameter. The sputtering conditions are thereby adapted as a result of the comparison.

Deposition of non-stoichiometric metal compound layer

A target for sputtering comprises SiZrxOy wherein x is higher than 0.02 but not higher than 5, and y is higher than 0.03 but not higher than 2*(1+x), wherein the target has an XRD pattern with silicon 2-theta peak at 28.29&#xb0;+/&#x2212;0.3&#xb0;, or a tetragonal phase ZrO2 2-theta peak at 30.05&#xb0;+/&#x2212;0.3&#xb0;. The target has a low resistivity, below 1000 ohm&#xb7;cm, preferably below 100 ohm&#xb7;cm, more preferably below 10 ohm&#xb7;cm, even lower than 1 ohm&#xb7;cm.

Conductive sputter targets with silicon, zirconium and oxygen

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Antwerp, Belgium

Ignacio Caretti Giangaspro