Kla Corporation

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Amnon Manassen

Vladimir Levinski

Raviv Yohanan

Avi Abramov

Eitan Hajaj

Diana Shaphirov

Etay Lavert

Shlomo Eisenbach

Ariel Hildesheim

Yoav Grauer

Isaac Salib

Michael Shentcis

An optical metrology tool may include one or more illumination sources to generate illumination having wavelengths both within a short-wave infrared (SWIR) spectral range and outside the SWIR spectral range, illumination optics configured to direct the illumination to a sample, a first imaging channel including a first detector configured to image the sample based on a first wavelength range including at least some wavelengths in the SWIR spectral range, a second imaging channel including a second detector configured to image the sample based on a second wavelength range including at least some wavelengths outside the SWIR spectral range, and a controller. The controller may receive first images of the sample from the first detector, receive second images of the sample from the second detector, and generate an optical metrology measurement of the sample based on the first and second images.

Optical metrology utilizing short-wave infrared wavelengths

Growing community of inventors

Milpitas, CA, United States of America

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