Canon Kabushiki Kaisha

Honda Giken Kogyo Kabushiki Kaisha

Honda Motor Co., Ltd.

Ichiro Tanaka

Akira Miyake

Tatsuya Yamazaki

Kazuaki Tashiro

Junichi Seki

Hideo Kato

Atsunori Terasaki

Tatsumi Shoji

Takafumi Okamoto

Yuichi Iwasaki

Akio Yamamoto

Keiichi Kawasaki

Hiromitsu Takase

Norimasa Kawagoe

Seiji Takeuchi

Yasuyuki Unno

Eiichi Murakami

Hiroshi Shinkai

Katsuhiko Kohyama

Yasuyuki Tomita

Masaki Tani

Yuichiro Hama

Kazuhiko Iwasaki

Junichi Yano

Isao Tanikawa

Noboru Okada

A charged particle beam apparatus for processing an object using a charged particle beam includes a charged particle lens in which an array of apertures, through each of which a charged particle beam passes, is formed; a vacuum container which contains the charged particle lens; and a radiation source configured to generate an ionizing radiation; wherein the apparatus is configured to cause the radiation source to pass the ionizing radiation through the array of apertures in a state in which a pressure in the vacuum container is changing.

Charged particle beam apparatus, and article manufacturing method

A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.

In situ cleaning device for lithographic apparatus

The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus including a first member in which an aperture, through which the charged particle beam passes, is formed, a chamber including a first space and a second space which are partitioned by the first member, and a removing device including a first supply device configured to supply a first gas containing unsaturated hydrocarbon to the first space and a second supply device configured to supply a second gas containing ozone to the second space, and configured to remove contamination on the first member by active species generated by reaction of the first gas with the second gas.

Drawing apparatus, and method of manufacturing article

The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams pass; and a cleaning unit configured to release active species to a decomposition product that has adhered to the electron lens and reduce the decomposition product by the reaction of the active species and the decomposition product to thereby change the decomposition product to a volatile gas. Here, the cleaning unit has a plurality of openings formed such that the active species are released toward the plurality of holes of the electron lens.

Charged particle beam drawing apparatus and article manufacturing method

A method for manufacturing a semiconductor device is provided, in which the lengths of a wiring trench and a via hole in a depth direction are easily controlled. A component having a first insulating film is prepared on a substrate, and a layer is disposed on the above-described first insulating film. A mold having a pattern is imprinted on the above-described layer so as to form a second insulating film having a wiring trench and a first via, the pattern corresponding to the wiring trench and the first via. Thereafter, the above-described first insulating film is etched by using the above-described second insulating film as a mask so as to form a second via, which is connected to the first via, in the first insulating film.

Method for manufacturing semiconductor device by using dual damascene process and method for manufacturing article having communicating hole

A membrane-electrode structure having an electrode catalyst layer adhered to a diffusion electrode, wherein the structure is manufactured by applying a catalyst paste onto a sheet substrate, and then dried to form a plurality of electrode catalyst layers. The electrode catalyst layers are thermally transferred onto each side of a polymer electrolyte membrane to form a laminated body. A first slurry is applied on a carbon substrate layer, and dried to form a water-repellent layer, and then, a second slurry is applied on the water-repellent layer, and dried to form a hydrophilic layer to form a diffusion electrode. The diffusion electrode is then laminated on the electrode catalyst layer through the hydrophilic layer, and then pressed under heating to integrate the laminated body and the diffusion electrode.

Method for producing membrane-electrode structure and polymer electrolyte fuel cell

In order to form three or more steps on a substrate with high precision, a first mask is formed to an area on the substrate corresponding with every other step, and also etching is performed on the area of the substrate to which the first mask is not formed, a second mask is formed to an area on the substrate to which the first mask has not been formed, and also etching is performed on the area on the substrate to which the first and the second masks are not formed.

Fine structure and devices employing it

A diffractive optical element, which is used for an optical system of an exposure apparatus, includes a light-shielding member composed of a laminated layer of Cr oxide and Cr at a periphery of an effective area.

Optical element and optical system

Disclosed is a method of manufacturing a two-dimensional phase type element, which includes the steps of forming, on a substrate, a first etching mask in a checkered pattern, forming segments of multiple levels at a portion not covered by the first mask, forming a second etching mask corresponding to an inversion of the first etching mask, removing the first etching mask, and forming segments of multiple levels at a portion not covered by the second etching mask.

Two-dimensional phase element and method of manufacturing the same

An electrode base material is held by electrostatic attraction when a voltage from a DC power source is applied to electrodes for electrostatic attraction. A paste is applied to the electrode base material, and then the paste is dried to form the water-repellent layer. Subsequently, another paste is applied to the water-repellent layer, and then the paste is dried. Accordingly, the substantially flat electrode catalyst layer including an extremely small number of depressions is formed. The electrode of the fuel cell produced as described above can be used as an anode or a cathode.

Method of and apparatus for producing electrode of fuel cell

Disclosed is a method of producing a two-dimensional phase type optical element, wherein a first mask and a second mask made of different materials and both having a stripe-like shape are superposedly formed on a substrate, along different directions, respectively, and wherein positions of all levels to be defined are determined on the basis of at least one of the first and second masks.

Method of producing two-dimensional phase type optical element

A SiO thin film is formed on a SiO substrate provided with a binary-type diffractive element by a radiofrequency sputtering process so as to cover the fine irregularities formed on the substrate caused by misalignment of masks in the production process. This film planarizes the surface having the fine irregularities and thus prevents a decrease in diffraction efficiency.

Method for making element

A method of manufacturing an element having a multiple-level step-like shape through plural lithographic processes, or a mold for production of such an element is disclosed, wherein a position of at least one step of the step-like shape is determined by an end of at least a portion of a pattern of a first mask to be formed through a first lithographic process of the plural lithographic processes.

Growing community of inventors

Utsunomiya, Japan

Ichiro Tanaka