Canon Kabushiki Kaisha

Sony Corporation

Formica Corporation

Other

Mitsubishi Heavy Industries Limited

Kaneka Corporation

Nkk Corporation

Mitsubishi Power, Ltd.

Saito, Ichiro

Ichiro Saito

Yoshiyuki Imanaka

Teruo Ozaki

Muga Mochizuki

Masahiko Kubota

Hiroyuki Ishinaga

Toshiyasu Sakai

Sakai Yokoyama

Masahiko Ogawa

Kazuaki Shibata

Takahiro Matsui

Takaaki Yamaguchi

Yuzuru Ishida

Satoshi Ibe

Kenji Ono

Masami Ikeda

Tomoyuki Hiroki

Takuya Hatsui

Maki Kato

Toshio Kashino

Ryoji Inoue

Yoshinori Misumi

Norihiro Yoshinari

Kenji Takahashi

Yoichi Taneya

Yoichi Osato

Toshimori Miyakoshi

Sadayuki Sugama

Masakazu Muroyama

Nobuyuki Matsumoto

Sadayoshi Sakuma

Makoto Sakurai

Motohiro Toyota

Toshiki Shimamura

Maki Nishida

William F Yates

Nobuyuki Hirayama

Shuji Koyama

Yoshio Takasu

Eiichi Fujii

Koichi Iida

Masao Kato

Hiroyuki Sugiyama

Hirokazu Komuro

Takeshi Yamagishi

Kozo Arao

Shinichi Tachizono

Akio Goto

Kouji Inoue

Takayuki Yagi

Kazuaki Masuda

Akihiro Yamanaka

Hiroaki Mihara

Kunikazu Tomita

Yasuyuki Takada

Tomio Aoki

Shiro Kenmotsu

Osamu Iwasaki

Kentaro Yano

Kenji Fujii

Hidehiko Kanda

Masanori Takenouchi

Kiyomitsu Kudo

Hiroyuki Suzuki

Mineo Shimotsusa

Kenji Kitabatake

Katsuhiko Takahashi

Toshiharu Inui

Kenichi Saito

Masashi Miyagawa

Aya Yoshihira

Tomonori Sato

Tatsuo Furukawa

Shinji Takagi

Yoshihiko Oda

Junichiro Iri

Masami Kasamoto

Atsushi Koike

Masashi Kitani

Shin Ishimatsu

Yukihiro Hayakawa

Takeru Yasuda

Benjamin Edward Russ

Koki Tateishi

Katsuhiko Takano

Jack Barger

Hiroaki Kato

Tetsuhito Ikeda

Yoshiaki Kurihara

Shigemi Yamane

Hiroshi Omata

Teruo Takeuchi

Shigeharu Iijima

Kazuya Hamada

Masao Mori

Yuki Kozuka

Shinya Iwahashi

Nobuo Yamagami

Yosuke Fujitomi

Takao Yagi

An inspection assistance device includes a damage drawing input part configured to input a damage drawing, i.e. a drawing illustrating damages of target parts, a display configured to display the damage drawing and target figures illustrating target parts to be overlaid with each other, and a storage configured to store the damage drawing separately from the target figures in connection with the target figures.

Inspection assistance device, inspection assistance method, and program

A liquid ejection head and its manufacturing method are capable of reducing the thickness of a protective layer as compared to the traditional technique so as to efficiently transfer the heat energy generated by a heating resistance element to a droplet of liquid such as ink. To achieve this, power supply wirings are provided in the same layer below the heating resistance element.

Liquid ejection head, method for producing liquid ejection head, and liquid ejection apparatus

The purpose of the invention is to provide a standard work time updating method and system in which a work time is declared by a worker without requiring an observer or the like and the reliability of the updated data of standard work time can be prevented from being degraded due to a worker's false or erroneous declaration. To achieve this purpose, for example, the standard work time updating system is configured as follows. When a reliability determination unit () determines that a work time required for work and declared by a worker is not departed from a predetermined range in the work time data distribution of the work stored in a database, a standard work time for the work is updated to a standard work time calculated from the declared work time, and otherwise, the standard work time is not updated. In addition, when it is determined that a work area estimated by a work area estimation unit () matches a work area declared by a worker, a standard work time for the work is updated to the calculated standard work time, and otherwise, the standard work time is not updated.

Standard work time updating method and system

A method of cleaning a liquid discharge head, which includes a heat generating resistor that generates thermal energy for discharging a liquid and a covering portion covering the heat generating resistor, includes alternately performing a first voltage application process and a second voltage application process multiple times, and reducing energy applied in the second voltage application process. The first voltage application process includes applying voltage between the covering portion and an electrode through the liquid to dissolve the covering portion in the liquid. The second voltage application process includes reversing relative polarities of the covering portion and the electrode in the first voltage application process and applying voltage between the covering portion and the electrode. Energy applied in the second voltage application process is reduced such that the energy applied is less than energy applied in the first voltage application process of an immediately preceding time.

Liquid discharge head cleaning method and liquid discharge apparatus

A reproduction method of a liquid ejecting head including: a process of filling the flow path with an electrolyte solution containing metal, and filling a space between an electrode capable of applying a voltage to between itself and the upper protective film and the upper protective film with the electrolyte solution; and a process of applying a voltage to between the upper protective film and the electrode to make the metal contained in the electrolyte solution deposit on the surface of the upper protective film.

Reproduction method of liquid ejecting head

When cleaning is performed to remove kogation, which is deposited on a heat acting portion, by causing an electrochemical reaction through application of a voltage between an upper electrode and an opposing electrode, a wiring located at a periphery of the opposing electrode occludes hydrogen generated during the cleaning, thereby causing hydrogen embrittlement. A unit configured to heat the wiring connected to the opposing electrode is provided, and is driven during the cleaning or after the cleaning, to thereby force hydrogen out of the wiring. Thus, the hydrogen embrittlement of the wiring is suppressed.

Liquid ejection head, method of cleaning the same, and recording apparatus

Cleaning under appropriate cleaning conditions is performed by disposing an electrode pair for measuring conductivity in the same liquid chamber as that of a material layer (i.e., an upper electrode) of a surface of a thermal action portion to be eluted, and measuring conductivity of a liquid using the electrode pair before kogation is removed.

Liquid ejection head, method for cleaning the head, recording apparatus provided with the head

In a method of manufacturing a liquid discharging head which includes a flow path forming member which has a discharge port for discharging a liquid and a liquid flow path communicating with the discharge port, and a base body having a liquid supply port which supplies the liquid flow path with the liquid, the method includes (1) forming a mold of the liquid flow path and a foundation member formed of a porous inorganic material over the base body, (2) applying an organic resin over the base body so as to cover the mold and the foundation member to form the flow path forming member, (3) forming the discharge port in the flow path forming member to form the liquid supply port in the base body, and (4) removing the mold to form the liquid flow path.

Method of manufacturing liquid discharging head

A method for cleaning a liquid ejection head which includes applying a voltage to a coating layer of the liquid ejection head to cause the coating layer to be eluted in a liquid so that kogation deposited on a coating layer is removed. When removing kogation deposited on the coating layer, temperatures of the liquids in the liquid chambers are selectively changed among a plurality of liquid chambers.

Method for cleaning liquid ejection head

In a liquid ejection head for ejecting liquid by using thermal energy, reduction of film thickness caused by elution of a protective layer when kogation on the protective layer is removed is made uniform and decrease in liquid ejection performance is suppressed. More specifically, a counter electrode is provided around a portion on which an ejection port of a flow path forming member is formed.

Liquid ejection head and liquid ejection apparatus

A recording element substrate includes a substrate; an insulating layer disposed on the substrate; a plurality of heating portions which are arranged on the insulating layer and which produce thermal energy used to eject a liquid; and a plurality of heat conduction members, each being located between adjacent heating portions with respect to an arrangement direction of the heating portions, the heat conduction members being located between the substrate side principal surface of the insulating layer and the heating portion side principal surface of the insulating layer and having higher thermal conductivity than the insulating layer. The heat conduction members are in contact with a heat conduction layer which has higher thermal conductivity than the insulating layer.

Recording element substrate, method of manufacturing the recording element substrate, and liquid ejection head

A print head includes upper protective members located at positions corresponding to heat generating resistor elements to protect the heat generating resistor elements, and further, a part of the protective member can be eluted into ink when a current flows inside in a state in which the ink is stored in the pressure chambers. The print head includes a drive element and a logic circuit capable of allowing a current to independently flow in each of the upper protective layers so as to elute a part of the upper protective layer, in which the current flows, into the ink.

Liquid ejecting head, substrate for liquid ejecting head, and printing apparatus

A liquid discharge device includes a liquid discharge head including a discharge port surface on which discharge ports for discharging liquid are formed, an electrothermal conversion element configured to generate energy for discharging liquid from the discharge ports, and a protection film configured to cover at least the electrothermal conversion element, and a cap configured to cover the discharge port surface, wherein the cap is arranged along the discharge port surface at a position opposite to the protection film via the discharge ports in a state where the cap covers the discharge port surface, and wherein the cap includes an electrode configured to be used to apply voltage between the protection film and the electrode.

Liquid discharge device and cleaning method for liquid discharge head

A liquid discharge apparatus includes: a liquid discharge head which includes; a discharge port to discharge a liquid; and a substrate including: an energy generating element for generating thermal energy to discharge the liquid from the liquid discharge port; a pair of electrodes connected to the energy generating element for driving thereof; an insulating layer of an insulating material provided to cover the energy generating element; and a metal layer of a metal material provided corresponding to the energy generating element to cover the insulating layer; and a driver unit which sets a first potential of one of the pair of electrodes substantially equal to the potential of the liquid and a second potential of the other one of the pair of electrodes lower than the first potential to drive the energy generating element.

Method for driving liquid discharge head, liquid discharge head, and liquid discharge apparatus

A liquid discharge head substrate includes a base; a pair of wiring lines; a heat-generating resistive layer, which is in contact with the wiring lines, and which has a portion corresponding to a space between the wiring lines, the portion forming an electrothermal transducer; an insulating layer which covers the heat-generating resistive layer and the wiring lines and which contains Si; a protective layer which covers at least one region of the insulating layer which contains Ir; and an intermediate layer which is placed between the insulating layer and the protective layer. The intermediate layer contains a material represented by the formula TaSiN, where x is 5 atomic percent to 80 atomic percent, y is 3 atomic percent to 60 atomic percent, z is 10 atomic percent to 60 atomic percent.

Liquid discharge head substrate, liquid discharge head, and method of manufacturing liquid discharge head substrate

Growing community of inventors

Yokohama, Japan

Ichiro Saito