Shin-etsu Chemical Co., Ltd.

Ichiro Kaneko

Toshihide Shimizu

Mikio Watanabe

Susumu Ueno

Toshinobu Ishihara

Hajime Kitamura

Shunichi Koyanagi

Yoshiteru Shimakura

Junji Tsuchiya

Jun Hatakeyama

Mutsuo Nakashima

Shigehiro Nagura

Tadashi Amano

Masahiro Yuyama

Kiyoshi Motomi

Atushi Sugitani

Niichiro Hasegawa

Satoshi Watanabe

Katsuya Takemura

Satoshi Okazaki

Yoshihumi Takeda

Makoto Fujiwara

Takeo Inoue

Tamotsu Maruyama

Tatsuya Fujimoto

Jiro Moriya

Toshimichi Koga

Katsuyuki Oikawa

Tokuji Abe

Michinori Tsuchida

Yoshio Inouye

Masayuki Suzuki

Yasuo Furukawa

Hajime Kutamura

Sensaku Katsushima

Sensaku Katusima

High molecular weight silicone compounds, resist compositions, and patterning method

A phase shift mask blank comprising a transparent substrate and at least one layer of a phase shifter thereon, wherein the phase shifter is a film composed primarily of a fluorine-doped metal silicide, can be fabricated into a high-performance phase shift mask having adequate transmittance and good stability over time even when used with light sources that emit short-wavelength light. The phase shift mask can be used to fabricate semiconductor integrated circuits to a smaller minimum feature size and a higher level of integration.

Phase shift mask blank, phase shift mask and method of manufacture

The invention provides a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000. Some or all of the hydrogen atoms of carboxyl groups or carboxyl and hydroxyl groups in the silicone compound may be replaced by acid labile groups.

High molecular weight silicone compounds resist compositions, and patterning method

In a silicone polymer having phenolic hydroxyl groups, the hydrogen atoms of some of the phenolic hydroxyl groups are replaced by acid labile groups of at least one type. The silicone polymer is crosslinked at some of the remaining phenolic hydroxyl groups with crosslinking groups having C--O--C linkages within a molecule and/or between molecules. The silicone polymer has a Mw of 5,000 to 50,000. A chemically amplified positive resist composition comprising the silicone polymer as a base resin has a high sensitivity and resolution so that it is suitable for fine patterning with electron beams or deep UV. Because of improved oxygen plasma etching resistance, the composition is suitable for use in the two-layer resist technique.

High molecular weight silicone compounds, chemically amplified positive

The invention provides a high molecular weight silicone compound comprising recurring units of the general formula (1) and having a weight average molecular weight of 1,000-50,000. ##STR1## Z is a di- to hexavalent, monocyclic or polycyclic hydrocarbon group or bridged cyclic hydrocarbon group of 5-12 carbon atoms, R.sup.1 is a substituted or unsubstituted alkyl or alkenyl group of 1-8 carbon atoms, R.sup.2 is an acid labile group, m is 0 or an integer, n is an integer, satisfying m+n.ltoreq.5, x is an integer, p1 and p2 are positive numbers, q is 0 or a positive number, satisfying 0&lt;p1/(p1+p2+q).ltoreq.0.9, 0&lt;p2/(p1+p2+q).ltoreq.0.9, 0.ltoreq.q/(p1+p2+q).ltoreq.0.7, and p1+p2+q=1. A chemically amplified positive resist composition comprising the high molecular weight silicone compound as a base resin is sensitive to actinic radiation and has a high sensitivity and resolution so that it is suitable for fine patterning with electron beams or deep UV. Since the composition has low absorption at the exposure wavelength of an ArF or KrF excimer laser, a finely defined pattern having walls perpendicular to the substrate can be readily formed.

High molecular weight silicone compound, chemically amplified positive

An anti-reflective coating composition comprising a polyimide dissolved in an organic solvent is used to form an anti-reflective coating beneath a chemical amplification type resist layer. The composition allows a fine resist pattern to be formed with high accuracy in a convenient, efficient, reproducible manner.

Anti-reflective coating composition

Polyimides comprising recurring units of the following general formula (1) ##STR1## wherein Ar.sub.1 represents a tetravalent aromatic group and each Ar.sub.2 represents a divalent aromatic group. Polyimide copolymers and preparations of the polyimides and the polyimide copolymers are also described.

Polyimides and processes for preparing the same

Polyimides comprising recurring units of the following general formula (1) ##STR1## wherein R.sub.1 represents a tetravalent aromatic group. Polyimide copolymers and preparations of the polyimides and the polyimide copolymers are also described.

Polyimides and processes for preparaing the same

This process is a method of preventing polymer scale formation in a polymerization vessel during the polymerization of a monomer having an ethylenically unsaturated double bond. The inner wall surface of a polymerization vessel is coated with a water-based coating solution containing (a) a water-soluble anionic dye and (b) at least water-insoluble cationic dye or water-insoluble nitrogen-containing organic compound, where the water-based coating solution has a pH of 7 or less. The coating solution is applied and then dried to form a coating.

Method of preventing polymer scale formation

A process for producing a vinyl chloride polymer by polymerizing a monomer comprising vinyl chloride by suspension polymerization in a polymerization vessel on the inner wall surface of which a coating of a polymer scale preventive agent is formed, comprising the steps of applying a high-speed shearing force to a mixture comprising water, the monomer, a polymerization initiator, and (A) a dispersant comprising a partially saponified polyvinyl alcohol having a specified average degree of polymerization and a specified degree of saponification plus (B) a dispersant comprising a hydroxypropylmethylcellulose which has a specified methoxyl substitution degree, a specified hydroxypropoxyl substitution degree, and a specified viscosity and subjecting the mixture to said suspension polymerization. A vinyl chloride polymer having an average particle diameter of 200 to 600 .mu.m and a narrow particle size distribution and excellent in plasticizer take-up, etc. is provided.

Process for producing vinyl chloride resin

A process for preparation of a vinyl chloride polymer comprising the steps of subjecting an aqueous medium containing vinyl chloride monomer or a mixture of vinyl chloride monomer with other vinyl monomer, a polymerization initiator and a dispersant to high-speed shear agitation at a shear rate of 10.sup.4 sec.sup.-1 or above to prepare a suspended dispersion containing fine particles of the monomer(s) dispersed therein, then subjecting the suspended dispersion to low-speed shear agitation at a shear rate of from 10 to 100 sec.sup.-1, and thereafter starting suspension polymerization. Even with a decreased amount of dispersant, the process inhibits the coarsening of the polymer particles, to yield the polymer with a narrow particle diameter distribution. Deposition of scale and formation of fish-eyes are also prevented effectively.

Preparation of vinyl chloride polymers using high-speed and low-speed

An improvement is proposed in the suspension polymerization of vinyl chloride monomer in order to obtain a polyvinyl chloride resin powder having good absorptivity of plasticizers by virtue of the well developed porosity of the resin particles and containing a decreased amount of fish eyes. The improvement comprises adding, to the polymerization mixture, a water-insoluble partially saponified polyvinyl acetate having an average degree of polymerization of at least 1000 and a degree of saponification of 20 to 60% in combination with a conventional water-soluble polymer as the suspending agent such as water-soluble partially saponified polyvinyl acetates and water-soluble cellulose ethers.

Method for the preparation of polyvinyl chloride resin

Matte vinyl chloride polymers are prepared by suspension polymerizing a vinyl chloride monomer or a vinyl monomer mixture mainly comprising vinyl chloride in an aqueous medium in the presence of (A) a polyfunctional monomer having at least two ethylenic double bonds in a molecule and (B) a polymeric matting agent containing 3 to 25% by weight of a tetrahydrofuran-insoluble gel fraction. The polymers are effectively moldable and present uniform matte effect.

Process for producing matte vinyl chloride polymers

An improved method for the suspension polymerization is proposed which gives a PVC resin product having an increased plasticizer absorptivity and greatly decreased content of fish eyes. The invention can be achieved by additionally adding a limited volume of water into the polymerization mixture under proceeding of the polymerization reaction within a specified period of 30 to 70% monomer conversion and at such a controlled rate as not to unduly decrease the pressure inside of the reactor. The improvements are particularly remarkable when the dispersing agent added to the polymerization mixture is a ternary combination of (A) a water-soluble partially saponified polyvinyl alcohol of a high degree of polymerization and a high degree of saponification, (B) a hydroxypropyl methyl cellulose having specified degrees of substitution with methoxy and hydroxypropoxy groups and specified viscosity characteristics and (C) a monomer-soluble partially saponified polyvinyl alcohol of a low degree of polymerization and a low degree of saponification, each in a specified amount.

Method for polymerizing vinyl chloride with controlled water addition

A method of preventing polymer scale deposition during polymerization of a monomer having an ethylenically double bond in a polymerization vessel, comprising the step of carrying out said polymerization in a polymerization vessel of which the inner wall surface has a coating comprising:

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Hazaki, Japan

Ichiro Kaneko