Fujifilm Corporation

Ichiro Amasaki

Keizo Kimura

Yukie Watanabe

Hiroshi Yokoyama

Naoyuki Hanaki

Takumi Nakamura

Kazushi Furukawa

Kyosuke Tsumura

Takashi Kitagawa

Youichi Nagai

Youichiro Takeshima

There is provided a new triazine-based compound which is useful as an ultraviolet absorber having excellent light resistance, heat resistance and ultraviolet ray shielding effect. A compound represented by the following general formula (1), 

Triazine derivative and ultraviolet absorber

To provide a novel triazine-based compound exhibiting an ultraviolet blocking effect even in the long-wavelength region and being useful as an ultraviolet absorber with excellent light resistance, and to provide an ultraviolet absorber and a resin composition, which can maintain a long-wavelength ultraviolet-blocking effect for a long period of time. A compound represented by the following formula (1): 

Triazine derivative, ultraviolet absorber, and resin composition

A polycarbonate resin composition comprising a compound represented by the following formula (1): 

Polycarbonate resin composition containing triazine compound and molded article using the same

To provide a polyester resin composition being able to maintain a long-wavelength ultraviolet-blocking effect for a long period of time, ensuring high solubility for a solvent, and having excellent light resistance. A polyester resin composition comprising a compound represented by the following formula (1) and a polyester resin: wherein each of R, R, R, Rand Rindependently represents a hydrogen atom or a monovalent substituent excluding OH, at least one of the substituents represents a substituent having a positive Hammett's &#x3c3;p value, and the substituents may combine with each other to form a ring; and each of R, R, R, R, R, R, Rand Rindependently represents a hydrogen atom or a monovalent substituent, and the substituents may combine with each other to form a ring.

Polyester resin composition

A formed resin article, containing a compound and a polymer substance,

Formed resin article and polymer film

An ultraviolet absorber composition is provided and includes: a compound represented by formula (I); and an ultraviolet absorber having a maximum absorption at a wavelength of from 340 to 400 nm: R, R, R, R, R, R, R, R, R, and Reach independently represent a hydrogen atom or a monovalent substituent except OH, or adjacent two of R, R, R, R, R, R, R, R, R, and Rmay be taken together to form a ring; R, R, R, and Reach independently represent a hydrogen atom or a monovalent substituent, or adjacent two of R, R, R, and Rmay be taken together to form a ring; and at least one of R, R, R, R, R, R, R, R, R, R, R, R, R, and Ris a substituent having a positive &#x3c3;p value in Hammett equation.

Ultraviolet absorber composition and resin composition

A compound represented by the following Formula (1): wherein, Hetrepresents a bivalent five- or six-membered aromatic heterocyclic residue and may further be substituted; Xto Xeach independently represent a heteroatom and may further be substituted; Yto Yeach independently represent a heteroatom or a carbon atom and may further be substituted; the ring bound to Hetmay have a double bond at any position.

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Odawara, Japan

Ichiro Amasaki