Sumitomo Chemical Company, Limited

Ichiki Takemoto

Ryo Yoshida

Katsuzo Kamoshita

Seizo Sumida

Nobuo Ando

Yukako Harada

Takayuki Miyagawa

Hiroshi Matsumoto

Eiki Nagano

Kazuhiko Hashimoto

Isao Yoshida

Yusuke Fuji

Junji Shigematsu

Masayuki Fukushima

Satoshi Yamaguchi

Tatsuro Masuyama

Nobushige Itaya

Junya Takahashi

Takashi Hiraoka

Fumio Fujita

Kouji Toishi

Haruhiko Katoh

Hiroshi Kishida

Yasunori Uetani

Hiromu Sakamoto

Mitsuhiro Hata

Yoshihiko Ito

Takeo Fujii

Hideyuki Goto

Norio Kawamura

Tamio Hayashi

Ritsu Okajima

A compounds represented by the Formula (I) or the Formula (I'). 

Compound, method for preparing the compound and resist composition containing the compound

The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

Chemically amplified positive resist composition

An imide compound represented by the formula (I): wherein Rrepresents a C1-C20 aliphatic hydrocarbon group etc., Wrepresents &#x2014;CO&#x2014;O&#x2014; etc., Qand Qeach independently represent a fluorine atom etc., and A represents a group represented by the formula (I-1): wherein Arepresents &#x2014;CH&#x2014;CH&#x2014; etc., and a chemically amplified resist composition containing the same.

Imide compound and chemically amplified resist composition containing the same

An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, Rrepresents a C1-C30 aliphatic hydrocarbon group etc., Rrepresents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents &#x2014;CO&#x2014;O&#x2014; etc., Qand Qeach independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.

Oxime compound and resist composition containing the same

The present invention provides a compound represented by the formula (I): wherein P, P, P, Pand Peach independently represents a hydrogen atom etc., and at least one selected from the group consisting of R, R, R, R, R, R, R, Rand Ris the group represented by the formula (II): 

Compound and chemically amplified resist composition containing the same

A resin comprising a structural unit represented by the formula (I): wherein Qand Qrepresent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more &#x2014;CH&#x2014; may be replaced by &#x2014;O&#x2014; etc., Xrepresents &#x2014;O&#x2014;CO&#x2014; etc., and Arepresents an organic counter ion.

Resin and chemically amplified resist composition comprising the same

The present invention provides a polyhydric compound represented by the formula (I): wherein Rto Reach independently represent a hydrogen atom etc., at least one selected from the group consisting of Rto Ris a group represented by the formula (II): wherein Qand Qeach independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., and Arepresents an organic counter ion, andthe others are hydrogen atoms or groups represented by the formula (III): wherein Xto Xeach independently represent a hydrogen atom etc., n represents an integer of 0 to 3, W represents any one of the following groups: Zrepresents a C1-C6 alkyl group etc., and ring Y represents a C3-C20 alicyclic hydrocarbon group, anda chemically amplified resist composition containing the same.

Polyhydric compound and chemically amplified resist composition containing the same

The present invention provides a chemically amplified resist composition comprising:

Resin suitable for an acid generator

The present invention provides a chemically amplified positive resist composition comprising  The present invention also provides an ester derivative useful as a component of the chemically amplified positive resist composition, and process for producing the ester derivative.

The present invention provides a salt represented by the formula (I): wherein Qand Qeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, T represents a methylene group or a carbonyl group, R represents an adamantyl group substituted with at least one selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group, a hydroxyl group, a hydroxymethyl group, a cyano group and an oxo group, and Arepresents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one &#x2014;CH&#x2014; group is substituted with &#x2014;COO&#x2014; group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Qand Qeach independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; Arepresents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

Salt suitable for an acid generator and a chemically amplified resist composition containing the same

The present invention provides a chemically amplified positive resist composition comprising  The present invention further provides a novel monomers useful for the resist composition, and process for the monomers and the compositions.

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Kawanishi, Japan

Ichiki Takemoto