General Atomics, Inc.

Ian Michael Barton

Steve Herman

Michael Dale Perry

Methods of fabricating large size, high performance multilayer diffraction gratings having a thick substrate that take advantage of reactive ion etching during the fabrication process are provided herein. In one implementation, a method of making a multilayer diffraction grating comprises the steps of: providing a substrate having a thickness of at least 2.0 cm; applying a dielectric structure having a plurality of layers on the substrate; depositing a photoresist; exposing the photoresist to a grating pattern; developing the photoresist to produce the grating pattern in the photoresist; and reactive ion etching to transfer the grating pattern to the dielectric structure. In preferred form, the substrate material of the grating is selected to have low electrical resistivity and high thermal conductivity.

Method for making large scale multilayer dielectric diffraction gratings on thick substrates using reactive ion etching

Systems are described that disperse the wavelength bands corresponding to the channel centers at a faster rate than the bandwidth of the channels themselves. An embodiment consists of a double element system including a grating, to create the initial separation, and a segmented mirror with multiple flat facets of different tilt, which reflect each spatially separated channel at a different angle. The size, position and angle of the facets are designed to match the spacing and position of individual channels of known wavelength and number that are diffracting from a grating with a predefined period, a set distance from this device. This system enables the individual channels to be re-imaged at some later point with a large separation between the channels, relative to their spatial size.

Wavelength separation elements for dense wavelength division multiplexing systems

A diffraction grating includes a metallic base layer and layers of dielectric materials of varying refractive index, where a bottom interface of the layers is adherent to the metallic base layer. The dielectric layers are periodically spaced on top of the metallic base layer, leaving the metallic base layer exposed in regions. This grating allows for the polarization insensitive reflective properties of the base metallic layer to operate in conjunction with the polarization sensitive diffraction properties of the multilayer grating structure to provide near 100% diffraction efficiency over a reasonable wavelength bandwidth, independent of the polarization of the incident beam.

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San Diego, CA, United States of America

Ian Michael Barton