Veeco Instruments Inc.

Ian Kunsch

Bojan Mitrovic

Alexander I Gurary

Sandeep Krishnan

Eric Armour

Chenghung Paul Chang

Matthew J Van Doren

David Gant

Aniruddha Bagchi

Brett Stuart Snowden

Gregory Williams

Aaron Frazier

Multi-filament heater assembly

An arrangement of two shutters radially outward from an injector block and a susceptor onto which a wafer carrier is removably mounted are configured to provide a flowpath through a reactor chamber that does not exhibit a vortex, thereby reducing or eliminating buildup on the inside of the reactor chamber and facilitating large temperature gradient between the injector block and the wafer carrier. This can be accomplished by introduction of a purge gas flow at a radially inner wall of an upper shutter, and in some embodiments the purge gas can have a different chemical composition than the precursor gas used to grow desired epitaxial structures on the wafer carrier.

Periphery purge shutter and flow control systems and methods

A seal having a cross-sectional profile that includes a first lobe, a second lobe, and a corner having an angle between 45 and 90 degrees, inclusive, a first side extending from the first lobe to the corner and a second side extending from the second lobe to the corner, where the first side and the second side define the corner angle. The seal can be seated in a groove so that the first lobe and the corner are in the groove and the second lobe extends from the groove. In use, the second lobe folds into the groove to form a fluid-tight seal.

Seal for wafer processing assembly

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Somerset, NJ, United States of America

Ian Kunsch