Macronix International Co., Ltd.

International Business Machines Corporation

I-Ting Kuo

Hsiang-Lan Lung

Huai-Yu Cheng

Cheng-Wei Cheng

Martin Michael Frank

Hiroyuki Miyazoe

Robert L Bruce

A high bandwidth non-volatile memory (NVM) is described suitable for providing neural network weight data to an AI accelerator processing core or cores. An artificial intelligence (AI) inference memory device employing the high bandwidth NVM technology as described herein can comprise a logic layer die including channel logic implementing connections between a plurality of channels for conducting data to and from an accelerator core via a bus and a plurality of non-volatile memory (NVM) dies stacked vertically one above another, forming a layered vertical stack of NVM dies, each of the NVM dies including at least one memory chip and a plurality of direct vertical connections to a corresponding channel in the logic layer.

High bandwidth non-volatile memory for AI inference system

A method for mitigating moisture driven degradation of silicon doped chalcogenides includes placing a silicon doped chalcogenide composition in a process chamber, passivating dangling silicon bonds of the silicon doped chalcogenide composition by flooding the process chamber with forming gas or with hydrogen plasma, purging the forming gas or the hydrogen plasma from the process chamber, and removing the passivated silicon doped chalcogenide composition from the process chamber.

Mitigating moisture driven degradation of silicon doped chalcogenides

A memory material and a memory device applying the same are provided. The memory material is a chalcogenide doped with carbon atom. The chalcogenide contains arsenic (As) atom, selenium (Se) atom, germanium (Ge) atom and silicon (Si) atom.

Memory material, and memory device applying the same

An ovonic threshold switch includes a first electrode, a second electrode, and an In-doped chalcogenide-based selector layer disposed between the first electrode and the second electrode, in which the In-doped chalcogenide-based selector layer has an In compound content of about 2 at. % to about 10 at. %. A memory cell including the In-doped chalcogenide-based selector layer is also provided.

Semiconductor device and memory cell

An ovonic threshold switch comprises a thin film composed essentially of Si, Ge, Se, As, and an amount of a chalcogen that is effective to passivate oxidation of the composition in the presence of water vapor, wherein the chalcogen is selected from the list consisting of: Te and S. In one or more embodiments, the chalcogen is S. In one or more embodiments, the chalcogen is Te. In one or more embodiments, the effective amount of the chalcogen is greater than 1% by atomic percent. In one or more embodiments, the effective amount of the chalcogen is less than 10% by atomic percent. In one or more embodiments, the composition of matter comprises 10% Si, 15% Ge, 40% Se, 30% As, and 5% chalcogen by atomic percent.

Suppressing oxidation of silicon germanium selenium arsenide material

A voltage sensitive switching device has a first electrode, a second electrode, and a switching layer between the first and second electrodes, comprising a composition of carbon C, arsenic As, selenium Se and germanium Ge thermally stable to temperatures over 400&#xb0; C. The switching device is used in 3D crosspoint memory.

C&#x2014;As&#x2014;Se&#x2014;Ge ovonic materials for selector devices and memory devices using same

A semiconductor device includes a first electrode, a second electrode, and an In-doped chalcogenide-based selector layer disposed between the first electrode and the second electrode, in which the In-doped chalcogenide-based selector layer has an In compound content of about 2 at. % to about 10 at. %. A memory cell including the In-doped chalcogenide-based selector layer is also provided.

A voltage sensitive switching device is described having a superlattice-like cell structure comprising layers of ovonic materials, such as chalcogenide alloys. Memory cells can include the switching device, such as can be utilized in a cross-point memory.

Superlattice-like switching devices

A voltage sensitive switching device has a first electrode, a second electrode, and a switching layer between the first and second electrodes, comprising a tellurium free, low germanium composition of arsenic As, selenium Se and germanium Ge. The switching device is used in 3D cross-point memory.

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Taoyuan, Taiwan

I-Ting Kuo