Other

Tamkang University

Industrial Technology Research Institute

National Science Council

Mastek Technologies, Inc.

I-Nan Lin

Chuen-Horng Tsai

Cheng-Hsien Chou

Ra-Min Tain

Ming-Ji Dai

Ton-Rong Tseng

Jung-Chieh Su

Zhen-Yu Juang

Yung-Sheng Liu

Teng-Fang Kuo

Chien-Kang Kao

Cheng-Chung Chi

Jin-Hua Huang

A method for fabricating a carbon-based composite material includes: bearing a carbon-based composite material layer containing an amorphous carbon matrix and a plurality of equi-axed ultrananocrystalline diamond grains dispersed in the amorphous carbon matrix on a susceptor and applying a plasma treatment on the carbon-based composite material layer in a plasma environment containing a Cspecies and a CN species. The susceptor is provided with a negative bias voltage, and is bombarded by the plasma species to be naturally heated to a working temperature less than 500&#xb0; C. The Cspecies and CN species are attracted by the negative bias voltage to the carbon-based composite material layer to make the carbon-based composite material layer generate a phase transformation, so as to facilitate growth of each of the adjacent equi-axed ultrananocrystalline diamond into a nano needle-like diamond grain wrapped by a nano graphite phase.

Method for fabricating carbon-based composite material

A plasma-generating device includes an anode plate and a cathode plate spaced apart from the anode plate. The cathode plate includes a substrate and a hybrid diamond layer formed on the substrate. The hybrid diamond layer includes ultra-nanocrystalline diamond grains, an amorphous carbon disposed among and bonded to the ultra-nanocrystalline diamond grains, micro-crystalline diamond grains disposed among the ultra-nanocrystalline diamond grains, and a graphite phase disposed among the ultra-nanocrystalline diamond grains. Each of the micro-crystalline diamond grains is surrounded by the graphite phase.

Plasma-generating device

A plasma deposition device for coating a substrate includes: a vacuum chamber; a waveguide disposed in the vacuum chamber for transmitting a microwave; an antenna unit disposed in the vacuum chamber above the substrate for receiving the microwave from the waveguide, and connected to the waveguide, the antenna unit including an outer conductor and an inner conductor wire that is disposed inside the outer conductor; a gas supplying conduit disposed inside the outer conductor and surrounding the inner conductor wire, and including a plurality of exhaust holes for blowing a plasma-inducing gas downward and toward the substrate to interact with the microwave and to produce plasma; and a blocking unit disposed in the vacuum chamber to prevent the plasma-inducing gas blown to the substrate from flowing back to the gas supplying conduit.

Plasma deposition device

A heat dissipation structure for an electronic device includes a body having a first surface and a second surface opposite to the first surface. A silicon-containing insulating layer is disposed on the first surface of the body. An ultrananocrystalline diamond film is disposed on the silicon-containing insulating layer. A first conductive pattern layer is disposed on the silicon-containing insulating layer and enclosed by the ultrananocrystalline diamond film, wherein the ultrananocrystalline diamond film and the first conductive pattern layer do not overlap with each other as viewed from a top-view perspective. A method for fabricating a heat dissipation structure for an electronic device and an electronic package having the heat dissipation structure are also disclosed.

Heat dissipation structure for electronic device and fabrication method thereof

A surface acoustic wave substrate includes: a diamond layer; a piezoelectric layer of aluminum nitride; and a titanium nitride-based buffer layer sandwiched between the diamond layer and the piezoelectric layer. The titanium nitride-based buffer layer includes a graded structure or includes a first sub-layer of titanium and a second sub-layer of titanium nitride sandwiched between the first sub-layer and the piezoelectric layer.

Surface acoustic wave substrate

A thermal cracking chemical vapor deposition method for synthesizing a nano-carbon material is provided. The method includes steps of (a) providing a substrate, (b) spreading a catalyst on the substrate, (c) putting the substrate into a reactor, (d) introducing a carbon containing material, and (e) heating the carbon containing material, thereby the carbon containing material being cracked to provide a carbon source for forming the nano-carbon material on the substrate.

Thermal pyrolysising chemical vapor deposition method for synthesizing nano-carbon material

This invention discloses a manufacturing process for preparing sol-gel optical waveguides comprising the steps of solution preparation, an optical waveguide photoresist module process, and optical waveguide molding and sintering. The solution is prepared by mixing water and alcohol to form an alcoholic solution with a properly adjusted pH value followed by mingling with tetraethylorthosilicate (TEOS) at room temperature. The optical waveguide photoresist module process comprises the steps of soft baking, exposure, development, washing by deionized water, drying by a nitrogen gun, and hard baking. The optical waveguide molding and sintering comprises the steps of spinning, sintering, and photoresist module removal.

Manufacturing process for preparing sol-gel optical waveguides

A CNC (computer numerical control) lathe includes a tailstock feed mechanism consisting of a feed hopper and an air cylinder for feeding a short workpiece, and a secondary tool turret having a feed chuck and a set of rear end cutting tools for processing the end of a bar stock material which has been processed by a main tool turret and a radial processing mechanism for processing a short workpiece delivered through the tailstock feed mechanism.

Growing community of inventors

Taipei, Taiwan

I-Nan Lin