Asml Netherlands B.v.

Hyunwoo Yu

Everhardus Cornelis Mos

Wim Tjibbo Tel

Emil Peter Schmitt-Weaver

Reiner Maria Jungblut

Bart Peter Bert Segers

Yichen Zhang

Petrus Gerardus Van Rhee

Maria Kilitziraki

Alexander Ypma

Xing Lan Liu

Marc Hauptmann

Weitian Kou

Michiel Kupers

Min-Sub Han

A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Computational metrology

A lithographic process is performed on a set of semiconductor substrates consisting of a plurality of substrates. As part of the process, the set of substrates is partitioned into a number of subsets. The partitioning may be based on a set of characteristics associated with a first layer on the substrates. A fingerprint of a performance parameter is then determined for at least one substrate of the set of substrates. Under some circumstances, the fingerprint is determined for one substrate of each subset of substrates. The fingerprint is associated with at least the first layer. A correction for the performance parameter associated with an application of a subsequent layer is then derived, the derivation being based on the determined fingerprint and the partitioning of the set of substrates.

Method and apparatus for optimization of lithographic process

Growing community of inventors

Hwaseong-si, South Korea

Hyunwoo Yu