Samsung Electronics Co., Ltd.

Hyunjin Ko

Seohyun Kim

Yongmyung Jun

Wooil Kim

Joungyeal Kim

Seongheon Yu

Seungbu Baek

Chulung Kim

Jae Seong Ryu

Hyeonsoo Sim

Inkwang Bae

A substrate processing chamber includes a housing providing a process space; a spin apparatus provided in the housing; and a fluid spraying nozzle configured to spray fluid into the process space, wherein the spin apparatus includes: a spin chuck configured to support a substrate; a rotation driving part configured to rotate the spin chuck; and a weight sensor configured to measure a weight of the substrate supported on the spin chuck.

Substrate processing chamber, substrate processing system including the same, and substrate processing method using the same

In a method of controlling on-die termination (ODT) in a memory system including a plurality of memory units that shares a data bus to transfer data, ODT circuits of the plurality of memory units are enabled into an initial state, a resistance value of the ODT circuit is set to a first resistance value, of at least one write non-target memory unit among the plurality of memory units during a write operation on a write target memory unit among the plurality of memory units, and a resistance value of the ODT circuit is set to a second resistance value, of at least one read non-target memory unit among the plurality of memory units during a read operation on a read target memory unit among the plurality of memory units.

Method of controlling on-die termination and memory system performing the same

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Yongin-si, South Korea

Hyunjin Ko