Eth Zurich

Heiq Materials Ag

Hyung Gyu Park

Murray Height

Kyoungjun Choi

Roman Wyss

Provided is a method for making a porous graphene layer of a thickness of less than 100 nm, including the following steps: providing a catalytically active substrate, said catalytically active substrate on its surface being provided with a plurality of catalytically inactive domains having a size essentially corresponding to the size of the pores in the resultant porous graphene layer; and chemical vapour deposition and formation of the porous graphene layer on the surface of the catalytically active substrate. The catalytically active substrate is a copper-nickel alloy substrate with a copper content in the range of 98 to less than 99.96% by weight and a nickel content in the range of more than 0.04-2% by weight, the copper and nickel contents complementing to 100% by weight of the catalytically active substrate.

Method for making porous graphene membranes and membranes produced using the method

The invention relates to a method for a fabrication of a pore comprising membrane and a pore comprising membrane. The pore comprising membrane () comprises at least a porous metallic layer () on a porous substrate (), wherein the porous metallic layer () is connected to the porous substrate () and the pores () of the metallic layer () overlap at least partially with the pores () of the porous substrate (). The method comprises at least the following steps: i) deposition of the metallic layer () onto a support material (), wherein the deposited metallic layer () forms a plurality of feedthroughs, in particular a percolation network on the support material (), ii) removal of the support material (), iii) connecting of the metallic layer () with the porous substrate () such that pores () of the metallic layer () overlap at least partially with the pores () of the porous substrate ().

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Seoul, South Korea

Hyung Gyu Park