Komico Ltd.

Hyunchul Ko

Dae-Hoon Jang

Sang-Gyu Park

Dong-Joo Kim

Donghun Jeong

Jin-Soo Park

Suntae Kim

The present invention provides a photoplasma etching device and a method of manufacturing the same, and more particularly to a member for a plasma etching device, which is improved in plasma resistance through deposition of a rare-earth metal thin film and surface heat treatment and the optical transmittance of which is maintained, thus being useful as a member for analyzing the end point of an etching process, and a method of manufacturing the same.

Photoplasma etching apparatus having improved plasma-resistant and manufacturing method therefor using a thermal diffusion phenomenon of a rare-earth metal thin film

Disclosed is an aerosol-deposition-coating method for plasma-resistant coating, in which the inside of a processing device can be protected from plasma during a plasma-etching process, the roughness of a coating layer on a metal substrate can be decreased to thereby reduce the generation of particles, and adhesion between the coating layer and the metal substrate can be enhanced.

Method of aerosol deposition coating for plasma resistant coating

Growing community of inventors

Anseong-si, South Korea

Hyunchul Ko