Samsung Display Co., Ltd.

Asm IP Holding B.v.

Samsung Sdi Co., Inc.

Hyundai Motor Company

Kia Motors Corporation

Hyunchul Kim

Yoonsun Choi

Wonsuk Choi

Seongryong Lee

Eunae Jung

YeaHyun Gu

Seongjun Lee

SeungWoo Choi

Seunghyun Lee

SeungHyun Lee

Hyun Soh

Naoki Inoue

Gwang Soo Hwang

Wonkyu Lee

Kyoung Wook Kim

Seyoung Oh

KiHun Kim

WooSik Shin

Hyejung Lee

Wonmo Park

Minsung Baik

An OLED device includes a substrate having a display region including a pixel region and first and second peripheral regions surrounding the pixel region. A bending region is between the display region and the second peripheral region. A buffer layer has a first opening exposing an upper surface of the substrate. A plurality of pixel structures is disposed in the pixel region on the buffer layer. An insulation layer structure is disposed on the buffer layer. The insulation layer structure has a second opening exposing an upper surface of the substrate that is disposed in the bending region and a first portion of the buffer layer that is disposed adjacent to the bending region. A fan-out wiring is disposed between two adjacent insulation layers of the plurality of insulation layers. The fan-out wiring is disposed in the first peripheral region and/or the second peripheral region.

Flexible organic light emitting display device and method of manufacturing the same

Methods of forming patterned features on a surface of a substrate are disclosed. Exemplary methods include using a plasma-enhanced cyclical deposition process to form a transformable layer including a first material and exposing the transformable layer to energy to form a second material. The first or second material can be selectively etched relative to the other of the first and second material.

Method and system for forming patterned features on a surface of a substrate using a plasma-enhanced cyclical deposition process

A method of manufacturing a display apparatus that is capable of reducing manufacturing costs and a defect rate during manufacturing, and a display apparatus. The method includes forming a plurality of display units over a mother substrate; attaching a temporary protective film to a lower surface of the mother substrate; cutting the mother substrate and the temporary protective film along a periphery of each of the plurality of display units to obtain a plurality of display panels, each including a first area, a second area, and a bent area between the first area and the second area; removing the temporary protective film from the plurality of display panels; and attaching a lower protective film to a lower surface of each of the plurality of display panels so as to correspond to the first area in each display panel.

Display apparatus and method of manufacturing the same

A display panel includes: a substrate including a first area, a second area, and a third area between the first area and the second area; a first structure located in the second area and including a pixel electrode, an opposite electrode, an intermediate layer between the pixel electrode and the opposite electrode, and at least one organic material layer; and a plurality of grooves located in the third area and separating the at least one organic material layer and the opposite electrode, wherein a first groove of the plurality of grooves is provided in a multi-layered film including a lower layer and an upper layer, wherein the upper layer includes an inorganic material layer and a first step adjacent to the first groove, the first step having an elevation higher than an upper surface of the lower layer.

Display panel including a plurality of grooves for separating organic material layers and electrodes and a display apparatus including the same

Provided is a method to adjust a film stress. In one embodiment, a first film is formed on the substrate by supplying a first reactant and a second reactant sequentially and alternately in a first step, and the first film is converted into a second film by supplying a third reactant to the first film in a second step. The film stress of the second film is adjusted by controlling the ratio of the first step and the second step.

Method for processing a substrate

A substrate processing method capable of filling a gap structure without forming voids or seams in a gap while minimizing damage to the gap structure includes: forming a first thin film on a structure by performing a first cycle a plurality of times, the first cycle including supplying a first reaction gas onto the structure including a gap and purging a residue, forming a second thin film by changing a chemical composition of the first thin film, and forming a third thin film having the same component as that of the second thin film on the second thin film while filling the gap.

Substrate processing method

Provided is a display apparatus capable of reducing generation of defects during manufacturing of the display apparatus or while in use after being manufactured. The display apparatus includes a substrate including a bending area between a first area and a second area, the substrate being bent in the bending area about a bending axis; an inorganic insulating layer over the substrate and including a first feature that is either a first opening or a first groove, the first feature positioned to correspond to the bending area; and an organic material layer at least partially filling the first feature, and including a second feature that is a second opening or a second groove, the second feature extending along an edge of the substrate.

Display apparatus having reduced defects

A display panel includes a substrate including an opening area, a display area, and a first non-display area, the first non-display area being between the opening area and the display area, a plurality of display elements arranged in the display area, a thin film encapsulation layer that covers the display elements, the thin film encapsulation layer including an inorganic encapsulation layer and an organic encapsulation layer, a groove in the first non-display area, a planarization layer in the first non-display area, the planarization layer covering the groove, a first inorganic insulating layer under the planarization layer such that the first inorganic insulating layer is between the planarization layer and the substrate, and a second inorganic insulating layer over the planarization layer.

Display panel

A substrate processing method of preventing damage to a lower patterned structure includes: forming a first thin film having a certain thickness by performing a first cycle a plurality of times, the first cycle including supplying a first reactant on a structure and purging a residue, and forming a second thin film by changing a chemical composition of the first thin film having the certain thickness.

Display panel including an open area for a component and a plurality of grooves provided in a multi-layered film with a step difference adjacent to the open area, and a display apparatus including the same

A substrate processing method capable of improving etch selectivity without increasing the power includes: forming a first thin film on a structure; forming a material layer having wet etch resistance greater than that of the first thin film on the first thin film; removing a portion of the material layer using wet etching to expose a portion of the first thin film; and removing the exposed portion of the first thin film.

Growing community of inventors

Yongin-si, South Korea

Hyunchul Kim